Proceedings of the 2001 IEEE International Frequncy Control Symposium and PDA Exhibition (Cat. No.01CH37218)
DOI: 10.1109/freq.2001.956363
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Measurement of static and vibration-induced phase noise in UHF thin film resonator (TFR) filters

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Cited by 3 publications
(2 citation statements)
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“…In another study [64], static phase noise and vibration sensitivity of a thin-film resonator (TFR) filter operating at frequencies of 640 and 2110 MHz were measured. [65] this study provides an accurate simulation of phase noise in voltage control generator (VCO) circuits using numerical solutions of equations to calculate the capacitance of a MEMS capacitor.…”
Section: Other Noise Sourcesmentioning
confidence: 99%
“…In another study [64], static phase noise and vibration sensitivity of a thin-film resonator (TFR) filter operating at frequencies of 640 and 2110 MHz were measured. [65] this study provides an accurate simulation of phase noise in voltage control generator (VCO) circuits using numerical solutions of equations to calculate the capacitance of a MEMS capacitor.…”
Section: Other Noise Sourcesmentioning
confidence: 99%
“…Conventionally, these devices are produced by depositing the oxides across the entire device, then patterning with photolithography, and finally etching away the parts unneeded. Common deposition techniques often require expensive infrastructure, toxic gaseous precursors, or high‐vacuum, and include molecular beam epitaxy, RF sputtering, metalorganic vapor phase epitaxy, and chemical vapor deposition …”
Section: Introductionmentioning
confidence: 99%