2009
DOI: 10.1016/j.ultramic.2009.05.003
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Measurement of specimen thickness and composition in AlxGa1-xN/GaN using high-angle annular dark field imag

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Cited by 171 publications
(74 citation statements)
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“…Here, both the theory will significantly be extended and realistic image simulations to accurately describe experimental images will be used [23][24][25][26] allowing us to demonstrate our method to technologically important materials.…”
mentioning
confidence: 99%
“…Here, both the theory will significantly be extended and realistic image simulations to accurately describe experimental images will be used [23][24][25][26] allowing us to demonstrate our method to technologically important materials.…”
mentioning
confidence: 99%
“…Proper settings were chosen to avoid beam damage and provide the best combination of signal-tonoise ratio, spatial and energy resolution. The results were simulated with the STEMSIM software package mimicking the experimental conditions [30][31][32][33]. Detailed experimental and simulation parameters can be found in the supplementary information [28].…”
mentioning
confidence: 99%
“…Static atomic displacements were taken into account and the simulations were carried out in dependence on specimen thickness and indium concentration ( figure 3). The specimen thickness is deduced by comparing the normalized intensities in regions of known concentration (GaN regions in this case) with the reference values for the according concentration (0% indium in this case) [7]. The specimen thickness is then interpolated over the regions of unknown concentration (figure 4).…”
Section: Specimen Thickness and Concentration Determinationmentioning
confidence: 99%