Measurement of Residual Birefringence Combined Photo-Elastic Modulation with Electro-Optic Modulation

Kewu, 李克武 Li; Liming, 王黎明 Wang; Zhibin, 王志斌 Wang; Rui, 张瑞 Zhang; Xiao, 李晓 Li; Shuang, 王爽 Wang

doi:10.3788/cjl201643.0508003

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Theory 21 Mueller Matrix Analysis Model For Optical Intensity1

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2023

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“…As shown in Fig. 1, the design of the optical path system is based on laser polarization technology [15][16][17][18] , and it is established as a single optical path crystal stress birefringence testing system with reference to the polarization state modulation and demodulation structure [19] . First, the Mueller matrix for a polarizer oriented at -45° with respect to the transmission axis is as:…”

Section: Theory 21 Mueller Matrix Analysis Model For Optical Intensitymentioning

confidence: 99%