2015 38th International Conference on Telecommunications and Signal Processing (TSP) 2015
DOI: 10.1109/tsp.2015.7296380
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Measurement of pulse-combining processing gain of UWB communication system using TIMS

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Cited by 3 publications
(2 citation statements)
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“…To continue the method assessment with compliant transducers, manufacturing procedures using reactive-ion etching in the micrometer range have been studied [ 13 ], as seen in Figure 19 a. These mechanical elements depicted in Figure 19 a,b are being investigated further [ 14 , 15 , 16 , 17 , 18 ].…”
Section: Discussionmentioning
confidence: 99%
“…To continue the method assessment with compliant transducers, manufacturing procedures using reactive-ion etching in the micrometer range have been studied [ 13 ], as seen in Figure 19 a. These mechanical elements depicted in Figure 19 a,b are being investigated further [ 14 , 15 , 16 , 17 , 18 ].…”
Section: Discussionmentioning
confidence: 99%
“…According to the known EM wave behavior in the Fraunhofer region, in an ideal case, the radiation pattern shape will not change with increasing distance [18], [19]. Other known restrictions and recommendations described in [20], [21] have to be observed as well. Once the desired measurement distance or distances are defined, the quadcopter pilot, situated on the ground, uploads the mission containing the flight path into the quadcopter guidance system.…”
Section: Ii2 Radiation Pattern Measurement Proceduresmentioning
confidence: 99%