Measurement Error Analysis for Mueller Matrix Based on a Single Photo-Elastic Modulator

Shaoqian, 曹绍谦 Cao; Yang, 步扬 Bu; Xiangzhao, 王向朝 Wang; Sikun, 李思坤 Li; Feilong, 汤飞龙 Tang; Zhongliang, 李中梁 Li

doi:10.3788/aos201333.0612010

Cited by 2 publications

(2 citation statements)

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“…20 世纪末以来，微处理器和动态随机存取存储器 (DRAM)特征尺寸的缩减呈现了加速和偏离摩尔定律的趋势，加速了光刻机的变革步伐 [1] 。光刻机从 65 nm 节点分辨力的 193 干式光刻发展到 32 nm 节点的 193 浸没式光刻。随着极紫外(EUV)光刻时代的来临，光刻的分辨力将提升至 22 nm 节点。根据瑞利衍射定理, 分辨力的提高可通过增大光刻数值孔径和缩短曝光波长实现。分辨力的提高是以牺牲焦深为代价，同时受其他因素的影响，如硅片工艺热处理、衬底的地形、硅片受真空吸附力、工件台步进误差等，有效的调焦焦深大幅缩小。因此为保证曝光线条质量和电路的成品率，需进行纳米级的高精度实时检焦 [2] 。在检焦精度需求较低的情况下，一般采用 CCD 光度检测方法，可以满足亚微米量级精度。针对纳米量级的焦面检测，有激光干涉检焦技术 [3][4] 、泰伯效应的叠栅条纹法 [5] 以及光弹调制法 [6][7][8] 。激光干涉检焦技术不 [9][10][11][12][13]…”

Section: 引言unclassified

Nano Focusing Method Based on Moire Fringe Phase Analysis

Jinhua¹,

Song²,

Yanli³

et al. 2015

光学学报

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With the improvement of lithography resolution node, high precision focus detection method becomes more and more important. The focus detection method which is based on moire fringe phase analysis and the triangulation principle is introduced. By analyzing optical modulation of photoelastic modulator and Savart plate, adjusting the parallel plate, the light intensity modulation which is caused by focal plane displacement changes in sine or cosine form. By analyzing the experimental data, focusing accuracy of this method is at nanoscale, hard real-time, and non-contact. It can meet the need of projection lithography with the line width of less than 100 nm.

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Section: 引言unclassified

Nano Focusing Method Based on Moire Fringe Phase Analysis

Jinhua¹,

Song²,

Yanli³

et al. 2015

光学学报

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“…Thin film technology continues to develop in the application of semiconductors and optical devices, and accurate and rapid acquisition of film thickness d has become an important direction of thin film research 1,8 .Thin film thickness d is an important parameter, which determines the optical and electrical properties of thin films. The measurement methods of film thickness are generally divided into non-optical methods and optical methods.…”

Section: Introductionmentioning

confidence: 99%

Phase delay calibration of optimization method in phase modulated ellipsometry

Wei

luo

et al. 2022

Thirteenth International Conference on Information Optics and Photonics (CIOP 2022)

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In order to achieve high sensitivity, accuracy and fast measurement of ellipsometry system, a phase modulation ellipsometry system based on Photoelastic Modulator (PEM) is adopted. At present, the phase delay of the Photoelastic Modulator is generally obtained by using the digital Lock-in Amplifier to extract the harmonic component and the DC component. The high frequency signal is discarded and the static phase delay of the Photoelastic Modulator is set as constant in the calculation process using the digital Lock-in Amplifier. However, the fluctuation of system parameters such as temperature, incident Angle and input signal will cause the decrease of measurement accuracy. In order to avoid the measurement error caused by traditional methods, an optimization method is proposed to calibrate the ellipsometry system with phase modulation. The nonlinear least square method is used to transform the ellipsometry measurement system into an optimization model, and the best match between the estimated value and the observed value is found. In order to verify the proposed optimization calibration method, the digital Lock-in Amplifier and the optimization method were used to scale the measurement system respectively, and the phase delay under the two methods were obtained respectively. The calculated deviations of the calibration of the two methods were 0.1805 and 0.141rad respectively, and the fluctuation of 1h calibration results was less than 1%. The results show that this method can reduce the influence of system parameter error on the measurement accuracy.

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Measurement Error Analysis for Mueller Matrix Based on a Single Photo-Elastic Modulator

Cited by 2 publications

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Nano Focusing Method Based on Moire Fringe Phase Analysis

Nano Focusing Method Based on Moire Fringe Phase Analysis

Phase delay calibration of optimization method in phase modulated ellipsometry

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