Measurement and calculation for reflective wavefront error of large optics at oblique incidence

Longbo, 徐隆波 Xu; You, 周游 Zhou; Rihong, 朱日宏 Zhu; Shijie, 刘世杰 Liu; Wanguo, 郑万国 Zheng

doi:10.3788/ope.20162412.3027

Cited by 1 publication

(2 citation statements)

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“…Where Loblique is the measured profile area by oblique incidence and Lreal is the profile area expanded to compensate by the oblique incidence α used in the lateral scale. In order to obtain the full-length measured mirror surface, the method of bicubic interpolation with less influence on the mirror surface can be used to restore the oblique incidence measurement mirror surface to the full-length surface 12 . Therefore, in the actual measurement, the interferometer aperture and the length of the measured mirror should be designed to adapt to the oblique incidence angle and measurement setup to achieve optimal measurement results.…”

Section: Oblique Incidence Measurementmentioning

confidence: 99%

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Surface measurements in oblique incidence for multiple elements piezoelectric x-ray bimorph mirror

Zhou,

Yuan,

Wang

et al. 2023

AOPC 2023: Optic Fiber Gyro

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The oblique incidence is a crucial metrology method to realize the measurement demand for high aspect ratio multiple elements piezoelectric X-ray bimorph mirror surface by small-aperture Fizeau interferometers in one single shot. Due to the change of optical path difference in oblique incidence, we analyzed how different oblique incidence angles would affect the results of the surface height with numerical simulation and evaluated angular errors when curved mirrors are measured.Then we constructed an oblique incidence measurement system for measuring the 200 mm X-ray bimorph mirror with multiple elements piezoelectric by using a 100 mm clear aperture Fizeau interferometer and return reference mirror based on a preliminary determination of the angle of oblique incidence, and so the precise angle of oblique incidence is calculated from the actual measurement results. The oblique incidence can directly observe the dynamic effects of a high aspect ratio X-ray bimorph mirror surface in response to the applied voltages. With practical interferometric measurements of the multiple elements piezoelectric X-ray bimorph mirror by the constructed oblique incidence measurement system, and we obtained multiple sets of response functions and optimized surface at different voltages. Furthermore, the bimorph mirror surface optimized height profile was experimentally controlled and measured to be 17.13 nm PV (peak to valley) at the centerline, which can lay the foundation for measuring the X-ray bimorph mirror surface with extremely high aspect ratios.

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Section: Oblique Incidence Measurementmentioning

confidence: 99%

“…Lin et al 11 proposed an absolute measurement method for oblique incidence measurement. Both domestic and abroad precise metrology laboratories have carried out corresponding studies using oblique incidence measurements and yielded excellent mirror surface shape results [12][13][14] .…”

Section: Introductionmentioning

confidence: 99%