1984
DOI: 10.1088/0022-3727/17/8/007
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Mean transverse emission energy and surface topography on GaAs (Cs,O) photocathodes

Abstract: A study has been made of the relationship between the facetting and surface structure observed upon (111)B and (100)GaAs photocathode surfaces and the mean transverse emission energy of the photoelectrons emitted from these cathodes. It is concluded that the mean transverse emission is largely independent of the degree of facetting and the presence of surface structure; however, a relationship exists between the temperature at which the cathode surface is cleaned and the mean transverse emission energy.

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Cited by 2 publications
(9 citation statements)
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“…The scattering process will tend to mask variations in ET due to variations in surface topography and this is in agreement with the results of earlier work (Rodway and Bradley 1984). In the Si ( C S , 0) system the layer is highly ordered and 1, would be expected to be long.…”
Section: Discussionsupporting
confidence: 90%
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“…The scattering process will tend to mask variations in ET due to variations in surface topography and this is in agreement with the results of earlier work (Rodway and Bradley 1984). In the Si ( C S , 0) system the layer is highly ordered and 1, would be expected to be long.…”
Section: Discussionsupporting
confidence: 90%
“…It is possible to make an estimate of the quantities of caesium and oxygen in a singletemperature layer from the time needed for the activation. It has previously been reported (Rodway 1984) that the caesium coverage at the initial photo-emission maximum is 3 of a monolayer. It has also been reported (van Bommel et a1 1978) that the sticking coefficient for caesium up to this first maximum is unity.…”
Section: Discussionmentioning
confidence: 89%
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