1982
DOI: 10.1016/0022-3093(82)90068-0
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MCVD preform central dip reduction by collapse under fluorinated atmosphere

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1983
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Cited by 6 publications
(2 citation statements)
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“…On the other hand, B 2 O 3 evaporation and its subsequent escape from reaction zone during final stages of deposition results in peak formation at the center of the RI profile. The magnitude of this central dip was reduced by using Freon gas at the initial collapse stage that has been reported to preferentially etch few microns of SiO 2 layer ( Ref 20,21).…”
Section: Change In Refractive Indexmentioning
confidence: 98%
“…On the other hand, B 2 O 3 evaporation and its subsequent escape from reaction zone during final stages of deposition results in peak formation at the center of the RI profile. The magnitude of this central dip was reduced by using Freon gas at the initial collapse stage that has been reported to preferentially etch few microns of SiO 2 layer ( Ref 20,21).…”
Section: Change In Refractive Indexmentioning
confidence: 98%
“…The outer and inner cladding of the fiber are both formed by a triangular array of air holes with the same lattice constant and diameter d. The inner core of the fiber with fixed diameter of 0.5 is composed of low germanium doped silica with a small central index dip which is introduced inevitably into the fiber perfomed by the MCVD process [10] . The refractive index increment of the germanium doped core keeps low (about 0.003, defined as n ) so that both the less transmission losses and higher negative dispersion coefficients can be reached.…”
mentioning
confidence: 99%