Abstract:Ge nanoclusters (NCs), synthesized by ion implantation and annealing up to 900 °C, result small (∼2 nm) and amorphous in Si3N4, crystalline and much larger in SiO2. The NCs ripening and crystallization kinetics in Si3N4 is retarded by larger interfacial energy and lower diffusivity of Ge in comparison to SiO2. Ge NCs absorb light more efficiently when embedded in Si3N4 than in SiO2. A significant effect of the barrier height on absorption was evidenced, in agreement with effective mass theory predictions. The … Show more
“…This point is further confirmed by previous observation of stoichiometric Si 3 N 4 and SiO 2 matrices implanted with Ge. 18 In that case, the lower diffusivity of Ge in Si 3 N 4 (below 7 Â 10 À17 cm 2 /s at 850 C) compared with SiO 2 (of the order of 10 À13 cm 2 /s at 800 C 28 ) retarded the QD ripening in Si 3 N 4 and led to the formation of a narrow size distribution ($2 nm) of Ge QDs in Si 3 N 4 against a more sparse array of larger QDs (size $ 3 _ 24 nm) in SiO 2 . In this paper, a similar behavior occurs for PECVD SiGeO and SiGeN alloys, indicating a clear role of the embedding matrix in the nucleation and growth of Ge QDs.…”
Section: Resultsmentioning
confidence: 99%
“…19 However, contrasting results appear in the literature for the growth kinetics of QDs in SiO 2 20 On the contrary, stoichiometric Si 3 N 4 films implanted with Ge showed retarded QD ripening and crystallization kinetics with respect to Ge QDs in SiO 2 implanted with the same Ge dose. 18 A significant role of the embedding matrix was also found for the optical bandgap of these systems, with Ge QDs in Si 3 N 4 absorbing light more efficiently than in SiO 2 . 18 This effect, together with the lower tunneling barrier height offered by Si 3 N 4 , could potentially open a route toward the fabrication of efficient photodetectors and solar cells.…”
Section: Introductionmentioning
confidence: 91%
“…18 A significant role of the embedding matrix was also found for the optical bandgap of these systems, with Ge QDs in Si 3 N 4 absorbing light more efficiently than in SiO 2 . 18 This effect, together with the lower tunneling barrier height offered by Si 3 N 4 , could potentially open a route toward the fabrication of efficient photodetectors and solar cells.…”
Section: Introductionmentioning
confidence: 91%
“…Other effects have been demonstrated to have a strong role in the light absorption/emission process such as: mid-gap states and defects at the interface with the matrix, [12][13][14] crystallinity (amorphous (a-) or crystalline (c-)) of QDs, 15 the shape of the QDs and their size distribution, 16,17 as well as the nature of the surrounding matrix. 18 However, one of the main problems with quantum dots embedded in dielectrics is the poor extraction of photo-generated carriers. Compared with silicon dioxide (SiO 2 ), silicon nitride (Si 3 N 4 ) matrix can be a promising new host matrix for QDs.…”
Germanium quantum dots (QDs) embedded in SiO2 or in Si3N4 have been studied for light harvesting purposes. SiGeO or SiGeN thin films, produced by plasma enhanced chemical vapor deposition, have been annealed up to 850 °C to induce Ge QD precipitation in Si based matrices. By varying the Ge content, the QD diameter can be tuned in the 3–9 nm range in the SiO2 matrix, or in the 1–2 nm range in the Si3N4 matrix, as measured by transmission electron microscopy. Thus, Si3N4 matrix hosts Ge QDs at higher density and more closely spaced than SiO2 matrix. Raman spectroscopy revealed a higher threshold for amorphous-to-crystalline transition for Ge QDs embedded in Si3N4 matrix in comparison with those in the SiO2 host. Light absorption by Ge QDs is shown to be more effective in Si3N4 matrix, due to the optical bandgap (0.9–1.6 eV) being lower than in SiO2 matrix (1.2–2.2 eV). Significant photoresponse with a large measured internal quantum efficiency has been observed for Ge QDs in Si3N4 matrix when they are used as a sensitive layer in a photodetector device. These data will be presented and discussed, opening new routes for application of Ge QDs in light harvesting devices.
“…This point is further confirmed by previous observation of stoichiometric Si 3 N 4 and SiO 2 matrices implanted with Ge. 18 In that case, the lower diffusivity of Ge in Si 3 N 4 (below 7 Â 10 À17 cm 2 /s at 850 C) compared with SiO 2 (of the order of 10 À13 cm 2 /s at 800 C 28 ) retarded the QD ripening in Si 3 N 4 and led to the formation of a narrow size distribution ($2 nm) of Ge QDs in Si 3 N 4 against a more sparse array of larger QDs (size $ 3 _ 24 nm) in SiO 2 . In this paper, a similar behavior occurs for PECVD SiGeO and SiGeN alloys, indicating a clear role of the embedding matrix in the nucleation and growth of Ge QDs.…”
Section: Resultsmentioning
confidence: 99%
“…19 However, contrasting results appear in the literature for the growth kinetics of QDs in SiO 2 20 On the contrary, stoichiometric Si 3 N 4 films implanted with Ge showed retarded QD ripening and crystallization kinetics with respect to Ge QDs in SiO 2 implanted with the same Ge dose. 18 A significant role of the embedding matrix was also found for the optical bandgap of these systems, with Ge QDs in Si 3 N 4 absorbing light more efficiently than in SiO 2 . 18 This effect, together with the lower tunneling barrier height offered by Si 3 N 4 , could potentially open a route toward the fabrication of efficient photodetectors and solar cells.…”
Section: Introductionmentioning
confidence: 91%
“…18 A significant role of the embedding matrix was also found for the optical bandgap of these systems, with Ge QDs in Si 3 N 4 absorbing light more efficiently than in SiO 2 . 18 This effect, together with the lower tunneling barrier height offered by Si 3 N 4 , could potentially open a route toward the fabrication of efficient photodetectors and solar cells.…”
Section: Introductionmentioning
confidence: 91%
“…Other effects have been demonstrated to have a strong role in the light absorption/emission process such as: mid-gap states and defects at the interface with the matrix, [12][13][14] crystallinity (amorphous (a-) or crystalline (c-)) of QDs, 15 the shape of the QDs and their size distribution, 16,17 as well as the nature of the surrounding matrix. 18 However, one of the main problems with quantum dots embedded in dielectrics is the poor extraction of photo-generated carriers. Compared with silicon dioxide (SiO 2 ), silicon nitride (Si 3 N 4 ) matrix can be a promising new host matrix for QDs.…”
Germanium quantum dots (QDs) embedded in SiO2 or in Si3N4 have been studied for light harvesting purposes. SiGeO or SiGeN thin films, produced by plasma enhanced chemical vapor deposition, have been annealed up to 850 °C to induce Ge QD precipitation in Si based matrices. By varying the Ge content, the QD diameter can be tuned in the 3–9 nm range in the SiO2 matrix, or in the 1–2 nm range in the Si3N4 matrix, as measured by transmission electron microscopy. Thus, Si3N4 matrix hosts Ge QDs at higher density and more closely spaced than SiO2 matrix. Raman spectroscopy revealed a higher threshold for amorphous-to-crystalline transition for Ge QDs embedded in Si3N4 matrix in comparison with those in the SiO2 host. Light absorption by Ge QDs is shown to be more effective in Si3N4 matrix, due to the optical bandgap (0.9–1.6 eV) being lower than in SiO2 matrix (1.2–2.2 eV). Significant photoresponse with a large measured internal quantum efficiency has been observed for Ge QDs in Si3N4 matrix when they are used as a sensitive layer in a photodetector device. These data will be presented and discussed, opening new routes for application of Ge QDs in light harvesting devices.
“…Several studies demonstrated how the optical properties of Si nanostructures can be varied by solely managing the nanostructure shape, 15 the QD crystalline structure, 16,17 or the potential barriers surrounding the QD. [18][19][20] Even though a multilayerednanostructure approach and an appropriate surface passivation could allow an efficient control of QCE via size-tuning only, 13 the optical properties of confined systems can be † SC contributed to sample processing, characterization, data analysis and interpretation, and drafted the manuscript. AMM performed STEM and EELS analysis, together with data interpretation.…”
Quantum confinement (QC) typically assumes a sharp interface between a nanostructure and its environment, leading to an abrupt change in the potential for confined electrons and holes. When the interface is not ideally sharp and clean, significant deviations from the QC rule appear and other parameters beyond the nanostructure size play a considerable role. In this work we elucidate the role of the interface on QC in Ge quantum dots (QDs) synthesized by rf-magnetron sputtering or plasma enhanced chemical vapor deposition (PECVD). Through a detailed electron energy loss spectroscopy (EELS) analysis we investigated the structural and chemical properties of QD interfaces. PECVD QDs exhibit a sharper interface compared to sputter ones, which also evidences a larger contribution of mixed Ge-oxide states. Such a difference strongly modifies the QC strength, as experimentally verified by light absorption spectroscopy. A large size-tuning of the optical bandgap and an increase in the oscillator strength occur when the interface is sharp. A spatially dependent effective mass (SPDEM) model is employed to account for the interface difference between Ge QDs, pointing out a larger reduction in the exciton effective mass in the sharper interface case. These results add new insights into the role of interfaces on confined systems, and open the route for reliable exploitation of QC effects.
Unlike conventional opaque solar cells, semi-transparent solar cells enable simultaneous electricity generation and light transmission. Along with solar energy harvesting, the offered multiple functionalities of these technologies, such as aesthetic appearance, visual comfort and thermal management, open diverse integration opportunities into versatile technological applications. In this work, the first demonstration of a novel semi-transparent solar cell based on ultrathin hydrogenated amorphous Si/Ge multiple quantum wells (MQW) is reported. Through optoelectronic modelling, the advantages of ultrathin MQW as photoactive material to overcome the intrinsic limitations of thin (20 nm) and ultrathin (2.5 nm) single quantum well (SQW) counterparts are explained. This allows extra degree of freedom for both optical design and bandgap engineering. Mainly, the multiplication of the QWs number in a periodic configuration, taking advantage of effective synergy between electronic and photonic confinements, leads to an improvement of photocurrent, while preserving high voltage and fill factor and ensuring significant transparency. The MQW new concept yields a boost in power conversion efficiency up to 3.4% and a considerable average visible transmission of about 33%. A light utilization efficiency above 1.1% is achieved, which can be considered as one of the highest among inorganic semitransparent solar cell technologies. The successful demonstration of ultrathin semitransparent Si/Ge MQW solar cells indicates the promising integration potential of this emerging photovoltaic technology for supplying systems in relevant applications such as in buildings, vehicles and greenhouses.
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