Materials processing with intense pulsed ion beams

Rej, D. J.; Davis, H.A.; Olson, Joseph; Ремнев, Г.Е.; Zakoutaev, A. N.; Рыжков, В. А.; Struts, V. K.; Isakov, I.F.; Шулов, В. А.; Nochevnaya, N. A.; Stinnett, R. W.; Neau, E.L.; Yatsui, Kiyoshi; Jiang, Weihua

doi:10.1116/1.580435

Cited by 109 publications

(16 citation statements)

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“…Samples of high purity (99.999%), electropolished single crystal and polycrystalline copper, silicon wafer, 600 grit roughened 75% Cu/25% Ni alloy, and lathe turned aluminum bronze (76% Cu, 14.5% AI, 5.5% Fe, 2% Mn, 2% Co) were placed in the beam path for treatment. Only results for the pure copper and silicon will be reported here; results for the Cu/Ni alloy and aluminum bronze will be re orted in a future publication.…”

Section: Resultsmentioning

confidence: 99%

Cratering behavior in single- and poly-crystalline copper irradiated by an intense pulsed ion beam

Wood¹,

Bitteker²,

Waganaar

et al. 1998

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When treated with intense pulsed ion beams (IPIB), many materials exhibit increased wear resistance, fatigue life, and hardness. However, this treatment often results in cratering and roughening of the surface. In this work, high purity single crystal and polycrystalline copper samples were irradiated with pulses from an IPlB to gain insight into the causes of this cratering behavior. Samples were treated with 1,2,5, and 10 shots at 2 J/cm2 and 5 J/cm2 average energy fluence per shot. Shots were about 400 ns in duration and consisted of a mixture of carbon, hydrogen, and oxygen ions at 300 keV. It was found that the single crystal copper cratered far less than the polycrystalline copper at the lower energy fluence. At the higher energy fluence, cratering was replaced by other forms of surface damage, and the single crystal copper sustained less damage at all but the largest number of shots. Molten debris from the Lucite anode (the ion source) was removed and redeposited on the samples with each shot.

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Section: Resultsmentioning

confidence: 99%

Cratering behavior in single- and poly-crystalline copper irradiated by an intense pulsed ion beam

Wood¹,

Bitteker²,

Waganaar

et al. 1998

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“…The primary application driving the development of this technology is inertial confinement fusion energy research [2], [3]. Recently, however, these ion beams with ion energies from 50 keV to 10 MeV, ion currents from 1 kA to 10 MA, and pulse durations from 10 to 1000 ns have been finding new applications in diverse fields such as materials processing [4], [5]. Because of the short range of the ions in matter, its application usually involves the surface modification of materials, e.g., implantation [6], alloy mixing [7], [8], defect formation [9], [10], and thin-film deposition [11], [12].…”

Section: Introductionmentioning

confidence: 99%

Characteristic Observation of Intense Pulsed Aluminum Ion Beam in Magnetically Insulated Ion Diode With Vacuum Arc Ion Source

Ito

Fujikawa

Miyake

et al. 2009

IEEE Trans. Plasma Sci.

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Intense pulsed heavy ion beam has been developed for a range of applications, including materials processing, particle accelerator injection for fundamental nuclear physics research, and other fundamental and applied purposes. For those applications, it is very important to generate high-purity ion beams with various ion species. We have developed a magnetically insulated ion diode for the generation of intense pulsed metallic ion beams in which the vacuum arc plasma gun is used as the metal ion source. The ion diode was operated at a diode voltage of about 200 kV, a diode current of about 15 kA, and a pulse duration of about 100 ns, and an ion beam with an ion current density of > 200 A/cm 2 and a pulse duration of 40 ns was obtained at 50 mm downstream from the anode. By evaluating the ion species and the energy spectrum of the ion beam via a Thomson parabola spectrometer, it was confirmed that the ion beam consists of aluminum ions (Al + , Al 2+ , and Al 3+ ) of energy 60-740 keV and proton impurities of energy 90-150 keV. The purity of the beam was estimated to be 89%, which is much higher than that of the pulsed ion beam produced in the conventional ion diode.Index Terms-Intense pulsed heavy ion beam, magnetically insulated ion diode (MID), pulsed power technology, vacuum arc plasma gun.

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“…In this work, we define as intense beams with pulse width of 50 to 1000 ns and ion current above 1 kA. Therefore, the pulsed ion beams have been studied for applications in material processings, such as surface treatment of metals, ceramics, and other materials [8][9][10], thin-film deposition [11,12], preparation of ultrafine particles [10,13], ion implantation [14], annealing [15], and other fields of material science. In 1990s, it was found that irradiation of pulsed ion beam on materials achieves adiabatic heating of surface layers at the depth of ion penetration (several hundreds of nanometers) and rapid quenching through thermal diffusion into bulk after irradiation, which is distinguished from the conventional ion beam irradiation technologies.…”

Section: Introductionmentioning

confidence: 99%

Characteristics of Pulsed Heavy Ion Beam Generated in Bipolar Pulse Accelerator

Ito

Kitajima

2016

Elect Comm in Japan

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We have developed a new type of a pulsed ion beam accelerator named "bipolar pulse accelerator" for improvement of the purity of the intense pulsed ion beam. The system utilizes a magnetically insulated accelerate on gap and was operated with the bipolar pulse. A coaxial gas puff plasma gun was used as an ion source, which was placed inside of the grounded anode. Source plasma (nitrogen) of current density of 30 A/cm 2 and pulse duration of 1.0 μs was injected into the acceleration gap. When the bipolar pulse of −114 kV, 70 ns (first pulse) and 85 kV, 62 ns (second pulse) was applied to the drift tube, the ions were successfully accelerated from the grounded anode to the drift tube in the first gap by the negative pulse of the bipolar pulse. The pulsed ion beam with current density of 60 A/cm 2 and pulse duration of 50 ns was obtained at 48 mm downstream from the anode surface. The energy spectrum of the ion beam was evaluated by a magnetic energy spectrometer. The ion energy was in reasonable good agreement with the acceleration voltage, that is, first pulse (negative pulse) voltage of the bipolar pulse. C⃝ 2016 Wiley Periodicals, Inc. Electron Comm Jpn, 99(9): 11-17, 2016; Published online in Wiley Online Library (wileyonlinelibrary.com).

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Materials processing with intense pulsed ion beams

Cited by 109 publications

References 0 publications

Cratering behavior in single- and poly-crystalline copper irradiated by an intense pulsed ion beam

Cratering behavior in single- and poly-crystalline copper irradiated by an intense pulsed ion beam

Characteristic Observation of Intense Pulsed Aluminum Ion Beam in Magnetically Insulated Ion Diode With Vacuum Arc Ion Source

Characteristics of Pulsed Heavy Ion Beam Generated in Bipolar Pulse Accelerator

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