Abstract:Recently, various efforts have been made to reduce the environmental burden caused by semiconductor manufacturing by improving the process efficiency. Chemical mechanical polishing (CMP), which is used to planarize thin films in semiconductor production, has also been studied to improve its efficiency by increasing the material removal rate (MRR) while reducing its environmental burden. Previous studies have been conducted to electrolytically ionize chemical solutions used in abrasive-free CMP for improving th… Show more
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