2015
DOI: 10.1039/c4nr06650b
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Material effects on V-nanoantenna performance

Abstract: There is great interest in aluminum based plasmonic devices due to the relatively high plasma frequency of this material as well as its low cost and self-passivating oxide layer. The passivation layer provides aluminum plasmonics with the long-term stability required for practical applications. While several studies have investigated the impact of this oxide layer on the plasmon resonances of aluminum nanostructures on glass substrates, little is known about the effect of high-refractive index substrates on th… Show more

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Cited by 3 publications
(2 citation statements)
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“…This numerical approach exceeds the possibilities that are feasible with experiments. As long as not otherwise specified, we present the results for an oxide thickness of 3 nm, which is a valid assumption [28,29]. Other thicknesses used in our simulations changed the results quantitatively but not qualitatively.…”
Section: Resultsmentioning
confidence: 81%
“…This numerical approach exceeds the possibilities that are feasible with experiments. As long as not otherwise specified, we present the results for an oxide thickness of 3 nm, which is a valid assumption [28,29]. Other thicknesses used in our simulations changed the results quantitatively but not qualitatively.…”
Section: Resultsmentioning
confidence: 81%
“…Due to the fact that amorphous silicon (Si) is widely used in thin-film solar cells, many of the plasmonics-related thin-film studies have concentrated on such systems [9,10]. Different levels of theory have been applied to various plasmonic device structures and materials [9,14,15], including the popular investigations where the surface of a semi-infinite substrate is mimicking the plasmonic device [7,8,16]. Plasmonic nanoparticles have also been applied to (single-crystal) silicon-oninsulator (SOI) photodetector and solar cell structures [1,10,[17][18][19].…”
Section: Introductionmentioning
confidence: 99%