2018
DOI: 10.1016/j.infrared.2018.09.012
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Material and device characterization of Type-II InAs/GaSb superlattice infrared detectors

Abstract: This work investigates midwave infrared Type-II InAs/GaSb superlattice (SL) grown by molecular beam epitaxy on GaSb substrate. In order to compensate the natural tensile strain of the InAs layers, two different shutter sequences have been explored during the growth. The first one consists of growing an intentional InSb layer at both interfaces (namely GaSb-on-InAs and InAs-on-GaSb interfaces) by migration enhanced epitaxy while the second uses the antimony-for-arsenic exchange to promote an 'InSb-like' interfa… Show more

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Cited by 15 publications
(33 citation statements)
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“…Further adjustment of the In and Sb shutter opening times could be made to reduce the thickness of the InSb interface layers, although it has been shown in Ref. [27] that exposing the InAs layer to an Sb incident flux to form an "InSb-like" interface via Sb-for-As exchange suffices to obtain a strain-compensated SL in the case of thinner InAs layer.…”
Section: Xrd and Pl Measurementsmentioning
confidence: 99%
“…Further adjustment of the In and Sb shutter opening times could be made to reduce the thickness of the InSb interface layers, although it has been shown in Ref. [27] that exposing the InAs layer to an Sb incident flux to form an "InSb-like" interface via Sb-for-As exchange suffices to obtain a strain-compensated SL in the case of thinner InAs layer.…”
Section: Xrd and Pl Measurementsmentioning
confidence: 99%
“…The dark current density of the nonbarrier Ga-based T2SL PDs is roughly in the range of 10 À5 -10 À7 A cm À2 (with some higher outliers) under an applied bias of 50-200 mV for intermediate temperatures of 70-99 K in the MWIR range. [101,111,181,[215][216][217][218] The best performing T2SL photodetector was reported by Schmidt et al [219] in 2017 using a P þ N À Ga-based T2SL barrier structure with a cut-off wavelength of %4.7 μm achieved at 77 K. A very low dark current density (J ~2.6 Â 10 À10 A cm À2 ) was achieved under an applied bias of 100 mV. In contrast, nonbarriers, Ga-free T2SL exhibit a slightly higher dark current density compared to Ga-based T2SL with dark current density is in the range of 10 À3 -10 À5 A cm À2 (with some higher/lower outliers) at an applied bias of 10-300 mV at the same operating temperatures.…”
Section: Dark Current Densitymentioning
confidence: 99%
“…[83] Generally, the best performing T2SL PDs with low dark current densities are achieved using barrier structures that are roughly four to five orders of magnitude higher than "Rule 07" at low operating temperatures (70-99 K) in the MWIR range. The variation in dark current density performance, due to changes in b) from 150 to 170 K for barrier Ga-free, [22,57,82,83,129,[144][145][146][147][148][160][161][162][163]166,192,223,224] nonbarrier Ga-free, [118,130,167,[220][221][222]225] barrier Gabased, [87,149,168,170,172,[174][175][176]183,193,219,[226][227][228] and nonbarrier Ga-based [68,101,108,111,173,[1...…”
Section: Dark Current Densitymentioning
confidence: 99%
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“…21 Commonly, the Molecular Beam Epitaxy (MBE) technique has been used in the construction of multilayer systems since the epitaxial relationship between the crystalline orientation of the substrate and the crystalline formation of the layer guarantees the electronic properties of the devices. [25][26][27] Therefore, the study of the morphological and structural features of interface layers is an essential factor, because breaking the translational and inversion symmetry is the cause of several electronic effects that produce consequences in functional properties. 28 The layer-layer coupling capability is relevant for the development of the CMOS technology, based on the integration between III-V compounds and Si.…”
Section: Introductionmentioning
confidence: 99%