Mass spectroscopic study of CH3 radicals produced in a hollow cathode discharge cell

Abstract

Experimental studies on a pulsed hollow cathode capillary discharge AIP Conf.Double modulationhigh resolution infrared spectroscopic technique: The ν3 band of the CH3 radical and excited states of CH4 in a hollow cathode discharge J. Chem. Phys. 100, 238 (1994); 10.1063/1.466991Mass spectroscopic investigation of the CH3 radicals in a methane rf discharge Appl.

Cold plasma chemistry and diagnostics

“…Ion attachment mass spectrometry with light ions, like Li + [41], and the use of electron energies below the dissociative ionization threshold are useful alternatives to prevent fragmentations. They have presently made the detection of radicals at very low concentrations possible, with direct sampling [42,43], or even employing molecular beams [44,45]. Plasma ions can be extracted directly from the discharge and focused on the mass filter of the spectrometer, without further electron-impact ionization, by using electrostatic lenses available in current plasma monitoring mass spectrometers.…”

From Carbon Nanostructures to New Photoluminescence Sources: An Overview of New Perspectives and Emerging Applications of Low‐Pressure PECVD

“…A recent and complete revision on the use of electrical probes can be found in the literature. [68] Mass spectrometry of ions with analysis of the ion energy distribution functions, [69,70] ion attachment mass spectrometry, [71] the use of different isotopes and mass spectrometry at threshold energies for radical detection, [72,73] are also very useful tools for plasma diagnostics, which have added new possibilities to the conventional mass spectrometry of neutral stable species with ionization by electron impact, where the detection of minor products has been mostly hampered by overlapping signals with peaks proceeding from the fragmentation patterns of compounds present at higher concentrations. Fiber-optic catalytic probes of various materials are beginning to be used to measure the dissociation degree of pure gases such as H 2 , O 2 , or N 2 in the afterglow of plasma reactors.…”

Plasma diagnostics and device properties of AlGaN/GaN HEMT passivated with SiN deposited by plasma-enhanced chemical vapour deposition

“…Plasma diagnostic, allowing to identify transient species, as well as stable products and other properties involved in plasma processing, has become a powerful method to understand the mechanisms which ultimately lead to the growth of films of the most diverse characteristics [19][20][21]. The diagnostic is mainly carried out with spectroscopic techniques like visible emission of excited species [6,[22][23][24][25] or infrared absorption of molecular bands [7,[26][27][28][29][30]; by mass spectrometry of neutrals [1][2][3]6,31,32] and ions [33][34][35], and with Langmuir probes [36,37].…”