Mass spectrometry investigation of magnetron sputtering discharges

Effect of gas pressure on ion energy at substrate side of Ag target radio-frequency and very-high-frequency magnetron sputtering discharge

“…Upon increasing the pressure, the single peaks all shift to the lower-energy side, and smaller low-energy peaks are developed. This shift of the peaks to lower energy and the development of a low-energy tail with the pressure increase have usually been observed in RF magnetron sputtering [2,8,10,11], and were thought to be due to the increase in collisions in the sheath. At the pressures of 7.5 Pa and 10.0 Pa, a low energy shoulder or low energy peak can be seen due to the increase in collisions within the sheath.…”

“…During deposition of film using magnetron sputtering, the energy of an ion incident on a substrate surface has a strong influence on the growth and properties of the film, such as the microstructure, crystallography, phase composition, and mechanical and optical properties. Therefore, to understand the mechanism of film growth, the ion energy at the substrate surface is of great interest [1][2][3][4][5][6][7][8][9][10][11][12][13][14].…”

Molecular dynamics simulation of hybrid structure and mechanical properties of DLC/Ni-DLC thin films

“…Ma Huizhong believes that in the deposition of thin lms, the low-temperature substrate is conducive to the deposition of DLC lms in the metal surface layer [10], this is because the temperature has a greater impact on the ionization motion of argon atoms, and different argon ion density largely affects the content of the sp2/sp3 in DLC lms; control of the role of the magnetic eld and voltage can make the deposited carbon atoms to obtain the appropriate energy, which regulates the sp2/sp3 structure ratio and reduces the lm residual stresses, enhances the bonding force between the lm and the substrate [11]. In addition to the effects of sputtering temperature and electromagnetic eld, the deposition air pressure also has a certain effect on the properties of DLC lms [12], and the energies of both sputtered ions and deposited particles increase with the increase of deposition air pressure [13][14]. The accumulation of the deposited particles obtaining high energy onto the surface of the substrate will increase the temperature of the growing lm, causing thermal migration of the mixed layer atoms and destroying the already formed diamond structure (sp3), while the diamond-structured DLC lms have high hardness and high wear resistance, and this good wear resistance is attributed to the hybridized bonding of the carbon atoms in the sp3 structure and the C-H covalent bonding will be broken and failed during friction, and the H atoms can quickly combine with the carbon atoms with dangling bonds to form the sp3 structure again and maintain the original diamond structure [15].…”

Effects of sputtering with Kr gas and insertion of lowermost layer on electrical resistivity of Ag-multilayer

“…[26][27][28][29][30][31] These reflected atoms move toward the substrate, and the nature and properties of these atoms affect the characteristics of the deposited layer. 32,33) The smaller the mass difference between the metal target atoms and the sputtering gas ions, the smaller the maximum energy of the reflected gas atoms becomes. For an Ag target with an atomic mass of 107.9 u, Kr with an atomic mass of 83.8 u has a smaller mass difference than Ar with an atomic mass of 40.0 u.…”