Surface oxidation can severely affect the behaviour of solid metals in several processes of technological interest, such as welding, soldering or metal matrixmetal reinforced composites casting [1]. It is well known [2] that the wettability of solid surfaces by liquid metals is inhibited by the presence of thin oxide surface layers; as a consequence, these types of technological processes are generally carried out under high vacuum or reducing atmospheres. In particular, when metals able to form volatile oxides and suboxides are considered, deoxidation of surfaces can be achieved by thermovacuum treatment, especially if the evaporation of oxides and suboxides is enhanced by providing quantitative removal of vapours from the gas phase overhanging the metal. The evaporation rates of any oxygen-containing species can be evaluated by using the Hertz-Langmuir-Knudsen equation [3], allowing the appropriate conditions for surface cleaning to be selected.A theoretical treatment for the surface cleaning of liquid metals under a vacuum via suboxides has been presented in a previous paper [4]. The approach developed in [4] can also be applied to surface oxidation/deoxidation of solid metals, and could be usefully exploited in any case in which a thin oxide film has to be removed from a solid surface by a thermovacuum treatment. Under very low oxygen pressures, extremely thin and presumably not continuous oxide films are expected to form [5]. It may be assumed that the coexistence of the first stable condensed oxide and the pure metal at the surface of the sample creates a three-phase equilibrium (gasoxide-metal), in a narrow layer immediately surrounding the condensed phase-gas interface. The oxidation/deoxidation process is controlled by the oxygen transfer and by vaporization/condensation of volatile oxides and suboxides at the metal surface.If the evaporation of oxides and suboxides from the surface is enhanced by a quantitative removal of their vapours from the gas phase (pumping, condensation on the reactor walls), a corresponding enhancement of the molecular oxygen pressure is necessary to saturate the metal; otherwise, the oxide film is eroded. The actual oxygen pressure needed to create a growing oxide film is higher than the equilibrium value: it can be evaluated by adding to the equilibrium saturation value a factor accounting for oxide vaporization, having the dimensions of an oxygen over-pressure. Thus the effective oxidation pressure P~,s is defined as If a metal sample is heated at a temperature T Ef under an oxygen partial pressure lower than Po~,~, any superficial oxide is expected to be eroded. The feasibility of vacuum deoxidation depends not only on the volatility of oxygen and of the oxides, but also on that of the metal: if the vapour pressure of the latter is much greater than that of the former, the oxygen loss from the sample is smaller than that of the metal, and oxygen concentrates in the metal phase. In this case, deoxidation at high temperatures cannot be achieved, even if the oxygen partial pres...