2001
DOI: 10.1016/s0169-4332(00)00890-4
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Mass density determination of thin organosilicon films by X-ray reflectometry

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Cited by 16 publications
(11 citation statements)
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“…A similar mass density of organosilicon plasma polymer films has been reported by Van der Lee and co-workers. 12 The density of the HMDSO film was determined to be lower than the AA plasma polymer, which can be explained in part by the greater bond length (1.64 Å) and angle (143°) of Si-O-Si species compared to the C-C tetrahedral geometry of (1.53 Å and 110°) the AA plasma polymer.…”
Section: Resultsmentioning
confidence: 93%
“…A similar mass density of organosilicon plasma polymer films has been reported by Van der Lee and co-workers. 12 The density of the HMDSO film was determined to be lower than the AA plasma polymer, which can be explained in part by the greater bond length (1.64 Å) and angle (143°) of Si-O-Si species compared to the C-C tetrahedral geometry of (1.53 Å and 110°) the AA plasma polymer.…”
Section: Resultsmentioning
confidence: 93%
“…27 This method allowed us to determine thickness of the layer, electron density and roughness of the sample's surface and interface. 28,29 It should be mentioned that this method allows the determination of the global roughness of the sample. X-ray photoelectron spectroscopy (XPS) measurements were made using a Scienta R4000 hemispherical analyzer (pass energy 200 eV) and Al K α (1486.6 eV) excitation.…”
Section: Test Equipmentmentioning
confidence: 99%
“…The central slit size was typically 15 microns. With this setup, a very good resolution can be obtained: film thicknesses up to 450 nm have been measured 11. Step sizes and step times were variable and chosen according to the intensity measured during fast prescans in small angular intervals in order to have at least 1 000 counts par step.…”
Section: Experimental Partmentioning
confidence: 99%