Mass and energy analysis and space-resolved measurements of ions from plasma focus devices

Bertalot, L.; Herold, H.; Jäger, U.; Mozer, Attila J.; Oppenlander, T; Sadowski, M.; Schmidt, H.

doi:10.1016/0375-9601(80)90272-8

Cited by 100 publications

(51 citation statements)

References 3 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…It can be explained based on the collision of the more high-energy ions with the sample surface by the increasing the number of focus deposition shots which will result in formation a coarser deposited coating. It is important to note that in plasma focus device the ions are radiated in a fountain-like structure, and their energy and flux vary with their angle relative to the anode axis [25]. Therefore, different area of the film surface is expected to have different roughness.…”

Section: Results Of Afm Analysismentioning

confidence: 99%

Deposition of magnesium nitride thin films on stainless steel-304 substrates by using a plasma focus device

2014

View full text Add to dashboard Cite

In this research, for the first time, we synthesize magnesium nitride thin films on 304-type stainless steel substrates using a Mather-type (2 kJ) plasma focus (PF) device. The films of magnesium nitride are coated with different number of focus shots (like 15, 25 and 35) at a distance of 8 cm from the anode tip and at 0°angular position with respect to the anode axis. For investigation of the structural properties and surface morphology of magnesium nitride films, we utilized the X-ray diffractometer (XRD), atomic force microscopy (AFM) and scanning electron microscopy (SEM) analysis, respectively. Also, the elemental composition is characterized by energy-dispersive X-ray (EDX) analysis. Furthermore, Vicker ' s microhardness is used to study the mechanical properties of the deposited films. The results show that the degree of crystallinity of deposited thin films (from XRD), the average size of particles and surface roughness (from AFM), crystalline growth of structures (from SEM) and the hardness values of the films depend on the number of focus shots. The EDX analysis demonstrates the existence of the elemental composition of magnesium in the deposited samples.

show abstract

Section: Results Of Afm Analysismentioning

confidence: 99%

Deposition of magnesium nitride thin films on stainless steel-304 substrates by using a plasma focus device

2014

View full text Add to dashboard Cite

show abstract

“…2b, the intensity of Cr (111) diffraction peak at the distance of 5 cm from the anode tip is decreased by increasing the angle from the anode axis from 0°to 15°and then to 30°. This phenomenon can explain that the ions generated at each shot in PF devices are propagated within a small solid angle around the anode axis and so the energy and flux of the ions decrease with the increase in angular positions [29]. So, an increase in the angle from the anode axis and hence, the reduction in energy and flux of the ions, lead to less growth of deposited films on the samples' surface and weaker relative intensity of Cr (111) diffraction peak is presented.…”

Section: Resultsmentioning

confidence: 96%

Deposition of Chromium Thin Films on Stainless Steel-304 Substrates Using a Low Energy Plasma Focus Device

et al. 2011

View full text Add to dashboard Cite

In this paper, we study thin films of chromium deposited on stainless steel-304 substrates using a low energy (1.6 kJ) plasma focus device. The films of chromium are likewise deposited with 25 focus shots each at various axial distances from the top of the anode (3, 5, 7, 9 and 11 cm). We also consider different angular positions with respect to the anode axis (0°, 15°and 30°) at a distance of 5 cm from the anode tip to deposit the chromium films on the stainless steel substrates. To characterize the structural properties of the films, we benefit from X-ray diffraction (XRD) analysis. Atomic force microscopy (AFM) and scanning electron microscopy (SEM) are applied as well to study the surface morphology of these deposited films. Furthermore, we make use of Vicker's micro-hardness measurements to investigate the mechanical properties of chromium thin films. The XRD results show that the degree of crystallinity of chromium thin films depends on the substrate axial and angular positions. The AFM images illustrate that the film deposited at the distance of 5 cm and the angular position of 0°has quite a uniform surface with homogeneous distribution of grains on the film surface. From the hardness results, we observe that the sample deposited at the axial distance of 5 cm from the anode tip and at the angle of 0°with respect to the anode axis, is harder than the other deposited films.

show abstract

“…The rationale behind comparing surface roughness in three areas is that, as it was also mentioned in previous part, in PF the ions are radiated in a fountain-like structure, and their energy and flux vary with their angle relative to the anode axis [44]. Thus, various areas of the deposited thin film surface are expected to have different surface roughness.…”

Section: Resultsmentioning

confidence: 98%

“…7 we found that at 8-14 cm distances from the anode tip, when the angular position of the samples from the anode axis increases from 0°to 10°to 30°, smaller relative intensities are observable for the WN (1 1 1), WN (2 0 0) and W (0 1 1) diffraction peaks. This phenomenon can be explained based on the results reported by Bertalot et al [44] who have shown that in PF, the ions generated at each shot are emitted within a small solid angle around the anode axis and their energy and flux decrease with the angle. Hence, it is predictable that at larger angles, reduced flux and energy of the ions lead to less material deposited on the substrate and therefore, smaller intensities of diffraction peaks are observed.…”

Section: Thin Film Deposition At Various Axial and Angular Positionsmentioning

confidence: 87%

Investigation of Effective Parameters on Metal Nitride Deposition by Plasma Focus Device: Number of Shots and Substrate Axial and Angular Positions

et al. 2015

View full text Add to dashboard Cite

Plasma focus (PF) technique is potentially promising candidate for the materials processing and surface modification because of the radiations in a wide range of energies. In this review paper, we discuss and report the use of PF device for transition hard metal nitrides thin film synthesis and investigation of some effective deposition parameters in PF. In this paper, we focus on tungsten nitride film, which has promising industrial and scientific applications. A systematic study has been performed to investigate the effect of the number of focus shots and substrate axial and angular positions on the physical properties of tungsten nitride film deposited by PF device. It is indicated that these parameters are effective in order to obtain good quality tungsten nitride film and estimating the optimum conditions for growing these films with desired physical properties.

show abstract

Mass and energy analysis and space-resolved measurements of ions from plasma focus devices

Cited by 100 publications

References 3 publications

Deposition of magnesium nitride thin films on stainless steel-304 substrates by using a plasma focus device

Deposition of magnesium nitride thin films on stainless steel-304 substrates by using a plasma focus device

Deposition of Chromium Thin Films on Stainless Steel-304 Substrates Using a Low Energy Plasma Focus Device

Investigation of Effective Parameters on Metal Nitride Deposition by Plasma Focus Device: Number of Shots and Substrate Axial and Angular Positions

Contact Info

Product

Resources

About