Maskless photolithography based on ultraviolet micro-LEDs and direct writing method for improving pattern resolution
Cuili Tan,
Tianyang Ren,
Daopeng Qu
et al.
Abstract:Ultraviolet micro-LEDs show great potential as a light source for maskless photolithography. However, there are few reports on micro-LED based maskless photolithography systems, and the studies on the effects of system parameters on exposure patterns are still lacking. Hence, we developed a maskless photolithography system that employs micro-LEDs with peak wavelength 375 nm to produce micrometer-sized exposure patterns in photoresists. We also systematically explored the effects of exposure time and current de… Show more
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