Maskless Patterning by Pulsed-Power Plasma Printing

Huiskamp, T.; Brok, W.J.M.; Stevens, A.A.E.; Heesch, E.J.M. van; Pemen, A.J.M.

doi:10.1109/tps.2012.2195510

Cited by 12 publications

(7 citation statements)

References 14 publications

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“…We model this behaviour with a Zener diode (just as was done in, e.g. [71] and [67]), because a Zener diode starts conducting above a certain voltage V br . When the Zener is conducting, a current will flow through the resistive load R p , which results in energy dissipation in this resistor (and the Zener diode).…”

Section: Spice Modelmentioning

confidence: 99%

Spatiotemporally resolved imaging of streamer discharges in air generated in a wire-cylinder reactor with (sub)nanosecond voltage pulses

Huiskamp

Sengers²,

Beckers

et al. 2017

Plasma Sources Sci. Technol.

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• A submitted manuscript is the author's version of the article upon submission and before peer-review. There can be important differences between the submitted version and the official published version of record. People interested in the research are advised to contact the author for the final version of the publication, or visit the DOI to the publisher's website.• The final author version and the galley proof are versions of the publication after peer review.• The final published version features the final layout of the paper including the volume, issue and page numbers. Link to publication Citation for published version (APA):Huiskamp, T., Sengers, W., Beckers, F. J. C. M., Nijdam, S., Ebert, U. M., van Heesch, E. J. M., & Pemen, A. J. M. (2017). Spatiotemporally resolved imaging of streamer discharges in air generated in a wire-cylinder reactor with (sub)nanosecond voltage pulses. Plasma Sources Science and Technology, 26(7), 075009. DOI: 10.1088/1361-6595/aa7587General rights Copyright and moral rights for the publications made accessible in the public portal are retained by the authors and/or other copyright owners and it is a condition of accessing publications that users recognise and abide by the legal requirements associated with these rights.• Users may download and print one copy of any publication from the public portal for the purpose of private study or research.• You may not further distribute the material or use it for any profit-making activity or commercial gain • You may freely distribute the URL identifying the publication in the public portal ? Take down policyIf you believe that this document breaches copyright please contact us providing details, and we will remove access to the work immediately and investigate your claim. Abstract. We use (sub)nanosecond high-voltage pulses to generate streamers in atmospheric-pressure air in a wire-cylinder reactor. We study the effect of reactor length, pulse duration, pulse amplitude, pulse polarity, and pulse rise time on the streamer development, specifically on the streamer distribution in the reactor to relate it to plasma-processing results. We use ICCD imaging with a fully automated setup that can image the streamers in the entire corona-plasma reactor. From the images, we calculate streamer lengths and velocities. We also develop a circuit simulation model of the reactor to support the analysis of the streamer development. The results show how the propagation of the high-voltage pulse through the reactor determines the streamer development. As the pulse travels through the reactor, it generates streamers and attenuates and disperses. At the end of the reactor, it reflects and adds to itself. The local voltage on the wire together with the voltage rise time determine the streamer velocities, and the pulse duration the consequent maximal streamer length.Spatiotemporally resolved imaging of streamer discharges in air generated in a wire-cylinder reactor with (sub

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Section: Spice Modelmentioning

confidence: 99%

Spatiotemporally resolved imaging of streamer discharges in air generated in a wire-cylinder reactor with (sub)nanosecond voltage pulses

Huiskamp

Sengers²,

Beckers

et al. 2017

Plasma Sources Sci. Technol.

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“…Specifically, the microplasma printer, which is a multi‐needle‐to‐plate dielectric barrier discharge (DBD) system, enables a dot‐wise plasma ignition on the surface. The microplasma printer was originally adopted for surface treatment and functionalization using nondepositing gases such as N 2 /O 2 mixtures . An example of patterning application was already mentioned above: a novel two‐step process for submillimeter scale area‐selective ALD of transparent conductive oxides by activation of H‐terminated Si using a microplasma printer before In 2 O 3 :H deposition by ALD .…”

Section: Introductionmentioning

confidence: 99%

TiO₂ thin film patterns prepared by chemical vapor deposition and atomic layer deposition using an atmospheric pressure microplasma printer

Aghaee

Verheyen

Stevens³

et al. 2019

Plasma Processes & Polymers

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A microplasma printer is employed to deposit thin film patterns of TiO2 by titanium tetra‐isopropoxide and N2/O2 plasma at atmospheric pressure. The setup is adopted to carry out deposition in two configurations, namely under chemical vapor deposition (CVD) and atomic layer deposition (ALD) modes. The properties of TiO2, as well as the patterning resolution, are investigated. The amorphous TiO2 deposited in the CVD mode contains a relatively high level of impurities (residual carbon content of 5–10 at.%) and is characterized by a low refractive index of 1.8. With the ALD mode on the other hand, TiO2 is obtained with a low level of impurities (<1 at.% C and <2 at.% N), a refractive index of 1.98, and a growth per cycle of 0.15 nm. Furthermore, the spatial resolution for a 8‐nm‐thick film is determined by X‐ray photoelectron spectroscopy line scan and found to be equal to 2,000 and 900 µm for the CVD and ALD modes, respectively. This study can be regarded as the first step toward area‐selective CVD and ALD of TiO2 by a microplasma printer, which can be further explored and extended to other material systems.

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“…There are two approaches currently used to overcome the incompatibility between water‐based ink and hydrophobic substrates: i) decreasing the ink surface energy density using a surfactant and/or low‐ST volatile solvents, which inevitably complicate the ink manufacture and stability; or ii) carrying out surface treatments (for instance, plasma or ultraviolet ozone UV / O 3 treatments) that can provide a strong modification of the surface energy in a predefined region of the substrate …”

Section: Resultsmentioning

confidence: 99%

Surface Charge Reversal Method for High‐Resolution Inkjet Printing of Functional Water‐Based Inks

Cobas

Muñoz-Pérez

Ridgway

et al. 2014

Adv Funct Materials

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wileyonlinelibrary.comlight-emitting diode (OLED) displays, printed organic solar cells, fl exible batteries, logic and memory components including organic fi eld-effect transistors and thin-fi lm transistors, fl exible displays, sensor arrays, radio frequency identifi cation tags, and superconducting tapes. [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15][16][17][18] To cite one recent outstanding application, the Panasonic Corporation unveiled in December 2013 a 56 in. 4K (high-pixel density) organic-inorganic hybrid OLED TV, where all the organic materials were deposited using IJP methods.This hybrid TV exhibits properties that are not easily achievable with either organic or inorganic materials alone, such as the best image quality ever, high contrast, fast response rate, high energy efficiency, and with the advantages of being ultrathin and lightweight. [ 16,19 ] Clearly, the manufacture of both organic and inorganic materials using IJP constitutes the next step toward a new generation of advanced materials and modern electronic devices, with a potential multibillion dollar market in the near future. [ 20 ] Therefore, considerable attention has been directed mostly toward the optimization of metal-organic inks, compatible with IJP technology, containing a single metal for direct metallization. [21][22][23][24][25][26][27] Such inks are already commercially available as a consequence of a huge global market desiring cheap inorganic conducting grids.However, the obtaining of sophisticated hybrid inks blending several metal-organic complex raw materials (HMOC) compatible with both the printer and the substrate is still being researched, and this approach is directly linked to the novel capabilities associated with the use of chemical solution deposition (CSD) to prepare self-assembled complex oxide nanostructures and multilayers under mild processing conditions. [28][29][30][31][32][33][34][35][36][37][38][39][40] Achieving the desired composition and the optimum rheological properties, together with the stabilization of several chemical bonds between organic and inorganic molecules, are critical issues during the manufacture of HMOC inks compatible with IPJ technology. In addition, the difference between the ink surface tension (ST) and the surface energy of a hydrophobic substrate has a profound effect on the adhesive strength of the complex linkages between the fl uid and the substrate, causing the ink drop to spread out or stop off during the drying process. [ 41 ] It is, therefore, highly desirable to develop a process Printed electronics is a rapidly growing area of research being explored for the manufacture of large-area and cost-effective electronic devices by the patterned application of functional inks. There are challenges associated with processing the inks compatible with inkjet printing technology and developing effi cient methods to successfully obtain the desired features, particularly when it comes to metal and metal-organic complex inks. Here, a reliable method is developed to achieve a so...

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Maskless Patterning by Pulsed-Power Plasma Printing

Cited by 12 publications

References 14 publications

Spatiotemporally resolved imaging of streamer discharges in air generated in a wire-cylinder reactor with (sub)nanosecond voltage pulses

Spatiotemporally resolved imaging of streamer discharges in air generated in a wire-cylinder reactor with (sub)nanosecond voltage pulses

TiO₂ thin film patterns prepared by chemical vapor deposition and atomic layer deposition using an atmospheric pressure microplasma printer

Surface Charge Reversal Method for High‐Resolution Inkjet Printing of Functional Water‐Based Inks

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Maskless Patterning by Pulsed-Power Plasma Printing

Cited by 12 publications

References 14 publications

Spatiotemporally resolved imaging of streamer discharges in air generated in a wire-cylinder reactor with (sub)nanosecond voltage pulses

Spatiotemporally resolved imaging of streamer discharges in air generated in a wire-cylinder reactor with (sub)nanosecond voltage pulses

TiO2 thin film patterns prepared by chemical vapor deposition and atomic layer deposition using an atmospheric pressure microplasma printer

Surface Charge Reversal Method for High‐Resolution Inkjet Printing of Functional Water‐Based Inks

Contact Info

Product

Resources

About

TiO₂ thin film patterns prepared by chemical vapor deposition and atomic layer deposition using an atmospheric pressure microplasma printer