Maskless extreme ultraviolet lithography

Choksi, Neha; Pickard, D. S.; McCord, Mark A.; Pease, R. F. W.; Shroff, Yashesh; Chen, Yijian; Oldham, W.G.; Markle, David A.

doi:10.1116/1.590952

Cited by 57 publications

(29 citation statements)

References 1 publication

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“…Consequently, the mask will be very fragile to environmental effects and particulation. A good solution to this problem may be to protect the mask in vacuum environment, but this time putting the mask into vacuum environment exposure chamber for exposure will be a time consuming and impractical task [8,9].…”

Section: Needs For Maskless Optical Lithographymentioning

confidence: 99%

“…Moreover, the fabrication of this reflector is not an easy and low cost process. Still a defect free Mo/Si mask fabrication is investigated, however, the cost of this mask is expected to be US $120000, and a mask set of 25-30 masks will be more than US $3 million [7,8]. Mask handling in EUV optical lithography also creates some problems for solid masks.…”

Section: Needs For Maskless Optical Lithographymentioning

confidence: 99%

“…When the excitation voltage is arranged so that the displacement is λ/4 of the incident beam wavelength, there occurs λ/2 path length difference be-tween two neighboring light beams. This path length difference creates an 180 o phase change and hence these light beams destructively interface [8]. EUV maskless lithography is the main target for piston micromirrors.…”

Section: Piston Micromirrorsmentioning

confidence: 99%

“…Figure 7 shows the simplified view of maskless EUV lithography which uses tilting micromirrors. The major challenges for realizing micromirror arrays for this lithography are fabricating very small area mirror elements and fabricating Mo/Si layers on top the mirror elements as EUV reflectors [8].…”

Section: 1tilting Micromirrorsmentioning

confidence: 99%

“…Simplified view of maskless EUV lithography using tilting micromirrors [8]. Figure 8 shows a tilting micromirror structure for EUV lithography pro-posed by University of Berkeley [15].…”

Section: Figurementioning

confidence: 99%

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A Review On Variable MEMS Mirrors For Photo-Lithographic Masks

Erismis

2013

A P J Eng Sci

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This paper presents a review on using MEMS based mirror arrays to achieve maskless lithography in order to eliminate mask costs in the micro fabrication processes. With the advanced technology nodes, it becomes more and more costly to produce the lithography masks. Especially with the extreme ultraviolet lithography technique, the necessity to use maskless lithography becomes more obvious. Several universities and companies fabricated tilting mirror style or piston style mirror arrays to propose a solution to maskless lithography processes. Keywords: Micromirror arrays, Maskless Lithography, MEMS ÖzetBu makale MEMS tabanlı mikro-ayna dizilerinin mikro-üretim adımlarında maske maliyetini azaltmak için maskesiz litografi elde etmek amaçlı kullanılması hakkında bir derleme sunmaktadır. Gelişmiş teknoloji nodlarıtla birlikte litografi maskelerini üretmek daha da pahalı olmaktadır. Özellikle EUV (ekstrim ultraviolet litografi) tekniğinde, maskesiz litografi kullanmak ihtiyacı daha da aşikar olmuştur. Maskesiz litografi adımlarına bir çözüm olması amacıyla, çeşitli üniversite ve şirketler dönen veya piston şeklinde mikro-ayna dizileri üretmiştir.

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Section: Needs For Maskless Optical Lithographymentioning

confidence: 99%

Section: Needs For Maskless Optical Lithographymentioning

confidence: 99%

Section: Piston Micromirrorsmentioning

confidence: 99%

Section: 1tilting Micromirrorsmentioning

confidence: 99%

“…Simplified view of maskless EUV lithography using tilting micromirrors [8]. Figure 8 shows a tilting micromirror structure for EUV lithography pro-posed by University of Berkeley [15].…”

Section: Figurementioning

confidence: 99%

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A Review On Variable MEMS Mirrors For Photo-Lithographic Masks

Erismis

2013

A P J Eng Sci

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Recent Progress in Simple and Cost‐Effective Top‐Down Lithography for ≈10 nm Scale Nanopatterns: From Edge Lithography to Secondary Sputtering Lithography

et al. 2020

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The development of a simple and cost‐effective method for fabricating ≈10 nm scale nanopatterns over large areas is an important issue, owing to the performance enhancement such patterning brings to various applications including sensors, semiconductors, and flexible transparent electrodes. Although nanoimprinting, extreme ultraviolet, electron beams, and scanning probe litho‐graphy are candidates for developing such nanopatterns, they are limited to complicated procedures with low throughput and high startup cost, which are difficult to use in various academic and industry fields. Recently, several easy and cost‐effective lithographic approaches have been reported to produce ≈10 nm scale patterns without defects over large areas. This includes a method of reducing the size using the narrow edge of a pattern, which has been attracting attention for the past several decades. More recently, secondary sputtering lithography using an ion‐bombardment technique was reported as a new method to create high‐resolution and high‐aspect‐ratio structures. Recent progress in simple and cost‐effective top‐down lithography for ≈10 nm scale nanopatterns via edge and secondary sputtering techniques is reviewed. The principles, technical advances, and applications are demonstrated. Finally, the future direction of edge and secondary sputtering lithography research toward issues to be resolved to broaden applications is discussed.

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Optical processing of bacterial libraries for directed evolution

Scruggs

Woodbury

2003

Biotech & Bioengineering

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Selection of phenotypically distinct bacterial colonies on a Petri dish is typically performed by one of two methods: chemical or mechanical. Chemical methods (e.g., antibiotic selection) rely on inherent growth advantages of the unique phenotypes desired and thus have limited applicability. Mechanical methods are generally slow and require relatively large colonies (typically hundreds of colonies per plate). Here the use of imaged light to select bacterial colonies is explored, employing either photodynamic therapy agents or a ferrochelatase mutation in combination with porphyrin precursors to sensitize the bacteria to light and a computer-controlled light projection system to illuminate some bacterial colonies while leaving others in the dark. A CCD camera was used to distinguish between bacteria expressing green fluorescent protein (GFP) from nonfluorescent colonies. The fluorescence image from the camera was then used to create a virtual masking image for photoselection. Using a simple commercial projector it was possible to confer a 56-fold selective advantage to colonies expressing GFP. This represents a potentially powerful tool in directed evolution experiments using large libraries.

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Maskless extreme ultraviolet lithography

Cited by 57 publications

References 1 publication

A Review On Variable MEMS Mirrors For Photo-Lithographic Masks

A Review On Variable MEMS Mirrors For Photo-Lithographic Masks

Recent Progress in Simple and Cost‐Effective Top‐Down Lithography for ≈10 nm Scale Nanopatterns: From Edge Lithography to Secondary Sputtering Lithography

Optical processing of bacterial libraries for directed evolution

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