Maskless electron beam lithography: prospects, progress, and challenges

Groves, Timothy R.; Pickard, D. S.; Rafferty, B.; Crosland, Nigel; Adam, Dieter; Schubert, G.

doi:10.1016/s0167-9317(02)00528-2

Cited by 77 publications

(48 citation statements)

References 9 publications

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“…43,44 Although multitiered features can be fabricated with high resolution, the fabrication takes a long time and requires precise alignment, making it unsuitable for fabricating complex structures.…”

Section: -13mentioning

confidence: 99%

Non-photolithographic plastic-mold-based fabrication of cylindrical and multi-tiered poly(dimethylsiloxane) microchannels for biomimetic lab-on-a-chip applications

2015

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To overcome the limitations of conventional lithography for generating cylindrical and multi-tiered microchannels, we demonstrate a facile and alternative route for non-photolithographic fabrication of plastic molds via micro-milling combined with hot embossing. First, semi-cylindrical negative channels were engraved on poly(methylmethacrylate) (PMMA) using a ball mill, and the obtained semi-cylindrical negative channel structure was transferred onto poly(ethyleneterephthalate) (PET) via hot embossing performed at a temperature intermediate between the glass transition temperature (T g ) values of the two thermoplastics. In this way, a positive semi-cylindrical channel structure was formed on the PET without distorting the original patterns on the PMMA. The PET mold with positive structures was then replicated onto poly(dimethylsiloxane) (PDMS) to produce negative semi-cylindrical channels, and by aligning two identical PDMS replicas, a cylindrical microchannel with a completely circular cross section was formed.Second, multi-tiered channel structures were readily obtained by controlling the depths of the microchannels in the micro-milling process. The effectiveness of the fabricated cylindrical and multitiered microchannels was evaluated by constructing a microvascular network and human liver sinusoid structure as proof-of-concept experiments. The simple fabrication and high precision in the resulting structures will pave the way for the construction of disposable biomimetic Lab-on-a-Chip (LOC) platforms with low manufacturing cost in a simple and facile manner feasible for mass production.

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Section: -13mentioning

confidence: 99%

Non-photolithographic plastic-mold-based fabrication of cylindrical and multi-tiered poly(dimethylsiloxane) microchannels for biomimetic lab-on-a-chip applications

2015

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“…Improving the resolution of this technique to tens of nanometers requires the use of smaller wavelengths for mask exposure (EUV (10-70 nm) or X-rays with wavelengths below 10 nm). So far, the trend towards device miniaturization sustained the development of advanced optical [8] and electron-beam lithography [9]. In turn, this increased enormously the fabrication cost of nanostructures.…”

Section: 'Conventional' Versus 'Non-conventional'mentioning

confidence: 99%

Semiconductor and insulator nanostructures: challenges and opportunities

Cojocaru

Ratto

Harnagea

et al. 2005

Microelectronic Engineering

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“…Katsumura et al (2005) adopted a new substrate made of a material that reduces the influence of the electron backscattering and attempted to record high-density patterning beyond 200 Gbit/in 2 density. However, the critical issue of electron beam lithography is its throughput, which prevents this technique from the mainstream of VLSI manufacturing (Groves et al 2002). Direct writing method was applied to fabricate high-density disk by (Cartwright 2002;Hosaka et al 2002), with which mass production cannot be achieved.…”

Section: Introductionmentioning

confidence: 99%

Fabrication of optical disk mastering using electron beam and embossing process

Pan

Yang

et al. 2007

Opt Quant Electron

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For the requirement of higher storage capacity of an optical disk, it is a good choice to shorten pit length and linewidth. However, the conventional laser beam mastering is difficult to fabricate smaller pit length and linewidth because of the optical diffraction limit. In order to solve this problem, optical disk mastering using electron beam lithography is presented. The process parameters of the electron beam mastering such as beam current, constant linear stage velocity, developing time, and focus distance are discussed in this research. In the experiments, it was found that the focus distance is an important parameter to fabricate nano-linewidth. The experimental results reveal that the 10 µm variance in focus distance causes about 12% variation in linewidth. The photoresist with nano-pattern defined by eletron beam was transferred into metal Ni-Co (Nickel-Cobalt) mold by electroplating process. The Ni-Co mold with hardness larger than Vicker Hardness (Hv) 650 was developed. Then, with the Ni-Co mold, LIGA (German: Lithographie GaVanoformung Abformung) process was applied to replicate high-density optical disk. The Ni-Co mold is served as a master for hot embossing process to transfer the nano-pattern onto PMMA sheet. Since the feature size is in nano-meter range, the study presents an innovative demolding mechanism to demold the master from the PMMA sheet without damaging the nano-meter structure. A spiral nanogroove with 112 nm in linewidth and 80 nm in depth has been successfully fabricated about 50 Gbytes storage capacity.

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Maskless electron beam lithography: prospects, progress, and challenges

Cited by 77 publications

References 9 publications

Non-photolithographic plastic-mold-based fabrication of cylindrical and multi-tiered poly(dimethylsiloxane) microchannels for biomimetic lab-on-a-chip applications

Non-photolithographic plastic-mold-based fabrication of cylindrical and multi-tiered poly(dimethylsiloxane) microchannels for biomimetic lab-on-a-chip applications

Semiconductor and insulator nanostructures: challenges and opportunities

Fabrication of optical disk mastering using electron beam and embossing process

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