Abstract:The extension of 193nm exposure wavelength to smaller nodes continues the trend of increased data complexity and subsequently longer mask writing times. In particular inverse lithography methods create complex mask shapes. We introduce a variety of techniques to mitigate the impact -data simplification post-optical proximity correction (OPC), LShots, multi-resolution writing (MRW) and optimization based fracture. Their potential for shot count reduction is assessed. All of these techniques require changes to t… Show more
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