Mask 3D effects on contact layouts of 1Xnm NAND flash devices

Jang, Jongwon; Jeong, Hyungjeong; Yune, Hyungsoon; Oh, Se‐Young; Yang, Hyunjo; Yim, Donggyu

doi:10.1117/12.2011659

Cited by 1 publication

(1 citation statement)

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“…The 3D mask scattering effect through sub-wavelength mask has been studied thoroughly in the past (1), however, the effect of 3D mask scattering to the shape of the patterns has not been discussed much. One recent paper has discussed the pattern shape fidelity issue associated with the 3D mask scattering effect, but mostly associated with pitch-dependent defocus (2). According to our study, due to contrast reduction at the dense pitch caused by 3D mask scattering effect, the pattern shape can also change in the 2 dimensions.…”

Section: Introductionmentioning

confidence: 57%

The Mask 3D Effect on 2D Pattern Shape Fidelity, a Simulation Study

Pei

Zheng

et al. 2014

ECS Trans.

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Mask 3D effect has been viewed as a drawback to the pattern fidelity with major characteristics in higher mask error factor (MEF), lower image contrast, or exposure latitude (EL), and reduced common depth of focus (DOF) between dense and semi-dense patterns. Recently, we found that the mask 3D scattering can also result in pattern shape variation, which can make optical proximity correction (OPC) less difficult. We use both thin mask simulation and the 3D mask simulation tools on a regular proximity test pattern of contact holes and found that the holes are usually elliptical and the degree of ellipse is primarily dependent on the relative image contrast values in the mutually orthogonal dimensions, or X and Y directions. And we found through simulation that the mask 3D scattering can reduce the imaging contrast in the relatively speaking denser dimension, which will make the contact look more round.

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Section: Introductionmentioning

confidence: 57%