MARS: Femtosecond laser mask advanced repair system in manufacturing

Haight, Richard; Hayden, Dennis; Longo, P.; Neary, Timothy E.; Wagner, Alfred

doi:10.1116/1.590968

Cited by 24 publications

(20 citation statements)

References 11 publications

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“…In this case, ablated material is directly transformed into plasma without going through the melting phase, therefore heat-affected zone (HAZ) is negligible. In accordance with theory, good results in laser ablation of metal thin films for mask repair were achieved with femtosecond pulses 8,12,13 . Resulting zaps had a sharp boundary between ablated and remaining material with minimal roll-up on the edges; underlying glass material kept high optical transparency with no evidence of metal diffusion into glass and no metal splatter or debris.…”

Section: Laser Module and Optical Configurationsupporting

confidence: 81%

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Advanced femtosecond DUV laser mask repair tool for large area photomasks

Treyger¹,

Fink²,

Koren³

et al. 2006

SPIE Proceedings

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In this paper we report for the first time on the development and performance of commercially available large area photomask repair tools of the MRT series. MRT+1500 / MRT+2000 are advanced laser-based tools specifically designed to repair high quality FPD (LCD & PDP) binary photomasks of Generations 6, 7, and beyond. MRT+2000 is the world's first commercial tool capable of handling and repairing Gen 7 photomasks with sizes up to two meters. Another unique feature of these tools is that they use a single DUV femtosecond laser to repair both opaque and clear defects with submicron laser spot size while a proprietary gantry motion system supports nanometer-scale accuracy and stability for edge lock. Key tool specifications, system architecture, design parameters, and laser processing specifics are discussed.

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Section: Laser Module and Optical Configurationsupporting

confidence: 81%

“…There are a few different approaches for laser spot formation in the photomask plane, such as focused laser beam 14 , nearfield optical scanning technique 15 , and projection system with imaged aperture 1,2,3,9,11,12,16 .…”

Section: Laser Module and Optical Configurationmentioning

confidence: 99%

Advanced femtosecond DUV laser mask repair tool for large area photomasks

Treyger¹,

Fink²,

Koren³

et al. 2006

SPIE Proceedings

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“…Therefore, direct-write laser patterning without the need of photolithography may offer an alternative and/or complementary solution. 1,2 The availability of ultra short, sub-ps, pulsed lasers has stimulated a growing interest in exploiting the enhanced flexibility of femtosecond technology for micro-machining. Ultra short laser pulses offer a variety of advantages for precision micro-fabrication.…”

Section: Introductionmentioning

confidence: 99%

Processing multilayer systems using femtosecond, picosecond, and nanosecond laser pulses at different wavelengths

Ashkenasi

Rosenfeld

2002

Photon Processing in Microelectronics and Photonics

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We performed ablation studies on multi-layer systems at different wavelength -pulse duration combinations. The multi-layer systems of interest, 150 nm thin indium tin oxide (ITO), 200 nm thin polyaniline (PANI) on 1 µm thick photo resist, and 280 nm PPV/pedot layer-combination on 150 nm thin ITO are optically transparent and used for a variety of industrial applications. One important goal of the study was to determine the possible process window for a complete removal of only the top layer, leaving the remaining layer basically unharmed. The investigations were conducted with the following wavelength -pulse duration combinations: 800 nm and 180 fs, 800 nm and 5 ps, 266 nm and 150 fs, 266 nm and 5 ns, 532 nm and 5 ns. We generated micro dots, lines and areas to determine the damage threshold, the processing quality and the processing speed for the specified application of selective layer removal. The structures were analyzed by means of optical and atomic force microscopy. In some cases, we observed a strong pulse duration dependence in the ablation threshold, an indication for the observed difficulties using laser pulses in the ns range. Comparative studies at different wavelengths demonstrate that laser pulses in the UV are not necessarily always a first choice to achieve a precise removal of the optically transparent top layer.

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“…Femtosecond laser ablation offers fundamental advantages for mask repair [10,11]. When the duration of a laser pulse is less than a few picoseconds, material can be ablated from a substrate via a non-thermal process [12][13][14].…”

Section: Introductionmentioning

confidence: 99%

MARS2: An Advanced Femtosecond Laser Mask Repair Tool

2002

Self Cite

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Femtosecond pulsed lasers offer fundamental advantages over other techniques for repairing lithographic masks. Since the femtosecond ablation process is non-thermal, the spatial resolution is not degraded by thermal diffusion and is therefore limited only by optical diffraction. In addition, metal splatter, gallium staining, reduced optical transmission, beam induced charging, quartz damage, and phase errors inherent in other repair methods are eliminated.A second generation femtosecond laser repair tool is described. The tool utilizes DUV optics which allow~100nm mask features to be imaged. The laser beam is focused to a round, gaussian spot. This gaussian spot is scanned over the defect, thus allowing arbitrarily shaped repairs to be performed with a spatial resolution of~100nm. Since the mask is not degraded in any way during the repair process, repairs can be performed iteratively by ablating small slices of the defect. Mask features can be trimmed to an RMS precision of~5nm. The system is also highly automated: masks are loaded into the tool from a SMIF pod via a robot and the tool is controlled from a single screen operator interface. This new tool has been operating successfully in the IBM Burlington mask house since late 2001, and is currently IBM's primary repair tool for 248 and 193nm chrome on glass and phase shift masks.

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MARS: Femtosecond laser mask advanced repair system in manufacturing

Cited by 24 publications

References 11 publications

Advanced femtosecond DUV laser mask repair tool for large area photomasks

Advanced femtosecond DUV laser mask repair tool for large area photomasks

Processing multilayer systems using femtosecond, picosecond, and nanosecond laser pulses at different wavelengths

MARS2: An Advanced Femtosecond Laser Mask Repair Tool

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