The platform will undergo maintenance on Sep 14 at about 7:45 AM EST and will be unavailable for approximately 2 hours.
2024
DOI: 10.1039/d4tc01587h
|View full text |Cite
|
Sign up to set email alerts
|

Mapping the Ge/InAl(Ga)As interfacial electronic structure and strain relief mechanism in germanium quantum dots

Mantu K. Hudait,
S. Bhattacharya,
S. Karthikeyan
et al.

Abstract: Tensile strained germanium (ε-Ge) has found significant interest due to its unique properties for emerging optoelectronic devices. High tensile strained Ge materials with superior quality are still being investigated due...

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

0
0
0

Publication Types

Select...

Relationship

0
0

Authors

Journals

citations
Cited by 0 publications
references
References 42 publications
0
0
0
Order By: Relevance

No citations

Set email alert for when this publication receives citations?