2022
DOI: 10.1021/acsomega.1c05552
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Mapping Oxidation and Wafer Cleaning to Device Characteristics Using Physics-Assisted Machine Learning

Abstract: It is always highly desired to have a well-defined relationship between the chemistry in semiconductor processing and the device characteristics. With the shrinkage of technology nodes in the semiconductors roadmap, it becomes more complicated to understand the relation between the device electrical characteristics and the process parameters such as oxidation and wafer cleaning procedures. In this work, we use a novel machine learning approach, i.e., physics-assisted multitask and transfer learning, to constru… Show more

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Cited by 5 publications
(5 citation statements)
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“…It is important to justify the name of the proposed algorithm, i.e., ML-assisted human decision. There have been a significant amount of works using physics-or domain-knowledge-assisted ML [40], [41], [42], [43], [44], [45], [46], [47]. The incorporation of domain knowledge into ML algorithms can be done in a variety of practices, and the common trait is that both domain knowledge-based information and ML-based information are put into a model of a certain kind to form a hybrid model.…”
Section: Resultsmentioning
confidence: 99%
“…It is important to justify the name of the proposed algorithm, i.e., ML-assisted human decision. There have been a significant amount of works using physics-or domain-knowledge-assisted ML [40], [41], [42], [43], [44], [45], [46], [47]. The incorporation of domain knowledge into ML algorithms can be done in a variety of practices, and the common trait is that both domain knowledge-based information and ML-based information are put into a model of a certain kind to form a hybrid model.…”
Section: Resultsmentioning
confidence: 99%
“…By predicting device properties, unnecessary device fabrication or expensive experimentation can be avoided, thus providing a more cost-effective route to device optimization. Using physics-assisted ML, Pratik et al [30] established the relationship between process conditions and device capacitance-voltage (C-V ) curves. The models were trained using theoretical C-V data at frequencies of 1 kHz, 3 kHz, 5 kHz, 10 kHz, 50 kHz, and 100 kHz and measured C-V data at 1 kHz and 100 kHz.…”
Section: Materials and Devices Optimizationmentioning
confidence: 99%
“…[26][27][28][29] Deep learning (DL) has been widely used in optoelectronic materials and often necessitates substantial volumes of data. Convolutional neural network (CNN), recurrent neural network (RNN), generative adversarial network (GAN), and graph neural network (GNN) are mainly applied to properties prediction, [30][31][32] structure prediction, [33][34][35] image analysis, [36] and optimization. [37] Nevertheless, numerous material or device datasets in practice fall short of achieving such scale.…”
Section: Introductionmentioning
confidence: 99%
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“…Theory-assisted ML has been drawing great attention over the past few years. The main idea is to count on prior knowledge and theory to reduce the loading of ML model training in terms of the required sample number and prediction accuracy. Various techniques have been proposed to realize domain knowledge assistance, including semisupervised learning, Bayesian statistics, supervised learning incorporating domain knowledge in some context, and theory-informed reinforcement learning (RL) .…”
Section: Introductionmentioning
confidence: 99%