We have studied photoluminescence (PL) properties of GaN thin films at low temperatures for various excitation intensities. Under weak excitation intensities, the free exciton line as well as the bound exciton line appear in the PL spectrum. With an increase of the excitation intensity, the M-line and the P-line due to inelastic exciton-exciton interactions are clearly observed. Under strong excitation intensities, electron-hole plasmas (EHP) emission appears at lower energy below the M-line. The radiative recombination processes of highly excited GaN are discussed.Recently, optical properties of wide band-gap semiconductors have extensively been studied. In particular, GaN and III-nitride compounds are promising materials for blue and ultraviolet optoelectronic devices because of their large exciton binding energies (e.g., 28 meV for GaN [1]). From the viewpoint of the fundamental physics, highly photoexcited GaN provide us with an excellent stages for studying the excitonic manybody effects in semiconductors [2,3]. The M-line [4,5], P-line [6], and electron-holeplasma (EHP) emissions [2] have been reported. However, the detailed power dependence of the photoluminescence (PL) spectrum and the PL intensity are not clarified. In this work, we have studied PL spectra of highly excited GaN thin films at a wide range of the laser power (1 nJ/cm 2 to 1 mJ/cm 2 ) and discuss many-body effects of correlated electron and hole systems.All samples used here were fabricated by means of a metal organic chemical vapor deposition (MOCVD) method. 5 mm GaN epitaxial layers were grown on GaN-buffer layers (25 nm) on c-plane (0001) of sapphire substrates. Since the free exciton energy depends on the strain of GaN films in the GaN/sapphire system, the photorefectrance (PR) measurement was carried out to determine the free exciton energy in our samples. For the PR measurements, the reflectance signals were modulated under a 325 nm He-Cd laser beam chopped at 210 Hz and were detected by a Si photodiode with a lock-in amplifier. The PL spectra under weak excitation were measured under a cw He-Cd (325 nm) laser excitation. For the study of the excitation intensity dependence of the PL spectrum, 130 fs and 333 nm laser pulses from optically parametric amplifier (OPA) systems (1 kHz repetition rate) were used as an excitation source and PL signals were dispersed by a 50 cm single-grating monochromator and detected by a liquid-nitrogen cooled charge coupled device (CCD). The beam spot size was carefully determined by a knife-edge method, which allow us to precisely evaluate the energy density of the excitation light. The spatial shape of the excitation laser beam was a Gaussian shape. The incident excitation density was varied from $1 nJ/cm 2 to $1 mJ/cm 2 .