Advances in Optical and Mechanical Technologies for Telescopes and Instrumentation III 2018
DOI: 10.1117/12.2314271
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Manufacturing silicon immersion gratings on 150-mm material

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Cited by 5 publications
(5 citation statements)
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“…We will not report on all of these instruments in this overview as they are covered in other reports in these proceedings. 27,28,29,30,31 The G-CLEF (GMT-Consortium Large Earth Finder) high-resolution optical spectrograph is the most mature GMT instrument at this time. 27 This instrument is being developed by a team at the Harvard-Smithsonian Center for Astrophysics with collaborators at several other institutions.…”
Section: Scientific Instrumentsmentioning
confidence: 99%
“…We will not report on all of these instruments in this overview as they are covered in other reports in these proceedings. 27,28,29,30,31 The G-CLEF (GMT-Consortium Large Earth Finder) high-resolution optical spectrograph is the most mature GMT instrument at this time. 27 This instrument is being developed by a team at the Harvard-Smithsonian Center for Astrophysics with collaborators at several other institutions.…”
Section: Scientific Instrumentsmentioning
confidence: 99%
“…We will not report on all of these instruments in this overview as they are covered in other reports in these proceedings. 27,28,29,30,31 The G-CLEF (GMT-Consortium Large Earth Finder) high-resolution optical spectrograph is the most mature GMT instrument at this time. 27 This instrument is being developed by a team at the Harvard-Smithsonian Center for Astrophysics with collaborators at several other institutions.…”
Section: Scientific Instrumentsmentioning
confidence: 99%
“…The magnification of the resolving power by the high refractive index of silicon enables the design of more compact and lower-mass spectrometers, as was first suggested by Dekker. 5 High-resolution spectrometers based on silicon immersion gratings have now been developed, or are in development, for a number of ground-based [6][7][8][9][10][11][12][13] and space-based 14,15 spectrometers.…”
Section: Introductionmentioning
confidence: 99%
“…The crystal orientation of the substrate and the orientation of the etch mask relative to the crystal axes are chosen such that the subsequent hydroxide etch process results in the formation of v-shaped grating grooves with the desired blaze angle due to the strongly anisotropic etch properties of the hydroxide etch step. 7,10,13,15,17 Any fabrication process has errors that are characteristic to the process. A grating made with a lithographic process may have large-scale errors at a very low spatial frequency resulting from motion system errors in the lithography tool that was used to create a photomask or to directly pattern an etch mask.…”
Section: Introductionmentioning
confidence: 99%
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