2018
DOI: 10.1016/j.mee.2018.01.031
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Manufacturing of highly-dispersive, high-efficiency transmission gratings by laser interference lithography and dry etching

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Cited by 19 publications
(12 citation statements)
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“…For further information on the patterning using two-beam laser interference lithography, see Ref. 19. The optimized resist profiles show no residual resist layer left at the grooves and a sufficiently large duty cycle of f ≈ 0.4 (Fig.…”
Section: Methodsmentioning
confidence: 99%
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“…For further information on the patterning using two-beam laser interference lithography, see Ref. 19. The optimized resist profiles show no residual resist layer left at the grooves and a sufficiently large duty cycle of f ≈ 0.4 (Fig.…”
Section: Methodsmentioning
confidence: 99%
“…The approach demonstrated in Ref. 19 can fortunately also be applied here and yields both higher maximum efficiencies as well as a more relaxed tolerance window, which is illustrated in Fig. 3.…”
Section: Design Considerationsmentioning
confidence: 96%
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