Manipulation of ion energies in pulsed laser deposition to improve film growth

Yao, Xiaoyu; Schneider, Claudia; Lippert, Thomas; Wokaun, Alexander

doi:10.1007/s00339-019-2644-3

Cited by 7 publications

(4 citation statements)

References 49 publications

(66 reference statements)

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“…Figure 2 shows SEM images and the X-ray photo-electron spectroscopy (XPS) characterization of the surfaces after TiO 2 deposition. A cobalt oxide CoO x cocatalyst layer was deposited using a pulsed laser deposition (PLD) setup based on a 248 nm wavelength KrF eximer laser [13]; PLD is a practical method to deposit materials from targets with complex composition at a fast deposition rate. The resultant surface morphology was inspected by SEM.…”

Section: Tio 2 and Coo X Cocatalyst Depositionmentioning

confidence: 99%

Black-Si as a Photoelectrode

et al. 2020

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The fabrication and characterization of photoanodes based on black-Si (b-Si) are presented using a photoelectrochemical cell in NaOH solution. B-Si was fabricated by maskless dry plasma etching and was conformally coated by tens-of-nm of TiO2 using atomic layer deposition (ALD) with a top layer of CoO x cocatalyst deposited by pulsed laser deposition (PLD). Low reflectivity R < 5 % of b-Si over the entire visible and near-IR ( λ < 2 μ m) spectral range was favorable for the better absorption of light, while an increased surface area facilitated larger current densities. The photoelectrochemical performance of the heterostructured b-Si photoanode is discussed in terms of the n-n junction between b-Si and TiO2.

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Section: Tio 2 and Coo X Cocatalyst Depositionmentioning

confidence: 99%

Black-Si as a Photoelectrode

et al. 2020

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“…Figure 2 shows SEM images and X-ray photo-electron spectroscopy (XPS) characterisaiton of the surfaces after TiO 2 deposition. A cobalt oxide CoO x cocatalyst layer was deposited using pulsed laser deposition (PLD) setup based on a 248 nm wavelength KrF eximer laser [13]; PLD is a practical method to deposit materials from targets with complex composition at fast deposition rate. Surface morphology was inspected by SEM.…”

Section: Methodsmentioning

confidence: 99%

Black-Si as Photoelectrode

Linklater¹,

Haydous²,

Cheng³

et al. 2020

Preprint

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The fabrication and characterisation of photo-anodes based on black-Si (b-Si) are presented using a photo-electrochemical cell in NaOH solution. Black-Si was fabricated by maskless dry plasma etching and was conformally coated by tens-of-nm of TiO2 using atomic layer deposition (ALD) with a top layer of CoOx cocatalyst deposited by pulsed laser deposition (PLD). Low reﬂectivity R < % of Black-Si over the entire visible and near-IR (λ < 2 µm) spectral range is favourable in better absorption of light while an increased surface area facilities larger current densities. Photoelectrochemical performance of the heterostructured photoanode is discussed in terms of n-n junction between b-Si and TiO2.

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“…In this case, both pulsed laser deposition (PLD) and magnetron sputtering (MSP) ensure conformal surface coating. PLD generates short time (µs) fluxes of condensable species with large kinetic energies (a few eV up to several tens eV) [20]. This favors layer-by-layer growth and, therefore, film crystallinity and conformal edge coverage.…”

Section: Néel Coupling At the Interfacementioning

confidence: 99%

Strontium Ferromolybdate-Based Magnetic Tunnel Junctions

et al. 2022

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Thin-film strontium ferromolybdate is a promising material for applications in room-temperature magnetic tunnel junction devices. These are spin-based, low-power-consuming alternatives to CMOS in non-volatile memories, comparators, analog-to-digital converters, and magnetic sensors. In this work, we consider the main tasks to be solved when creating such devices based on strontium ferromolybdate: (i) selecting an appropriate tunnel barrier material, (ii) determining the role of the interface roughness and its quantification, (iii) determining the influence of the interface dead layer, (iv) establishing appropriate models of the tunnel magnetoresistance, and (v) promoting the low-field magnetoresistance in (111)-oriented thin films. We demonstrate that (i) barrier materials with a lower effective electronegativity than strontium ferromolybdate are beneficial, (ii) diminution of the magnetic offset field (the latter caused by magnetic coupling) requires a wavy surface rather than solely a surface with small roughness, (iii) the interface dead-layer thickness is of the order of 10 nm, (iv) the tunnel magnetoresistance deteriorates due to spin-independent tunneling and magnetically disordered interface layers, and (v) antiphase boundaries along the growth direction promote the negative low-field magnetoresistance by reducing charge carrier scattering in the absence of the field.

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Manipulation of ion energies in pulsed laser deposition to improve film growth

Cited by 7 publications

References 49 publications

Black-Si as a Photoelectrode

Black-Si as a Photoelectrode

Black-Si as Photoelectrode

Strontium Ferromolybdate-Based Magnetic Tunnel Junctions

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