Patterned
poly(oligo ethylene glycol) methyl ether methacrylate
(POEGMEMA) brush structures may be formed by using a combination of
atom-transfer radical polymerization (ATRP) and UV photopatterning.
UV photolysis is used to selectively dechlorinate films of 4-(chloromethyl)phenyltrichlorosilane
(CMPTS) adsorbed on silica surfaces, by exposure either through a
mask or using a two-beam interferometer. Exposure through a mask yields
patterns of carboxylic acid-terminated adsorbates. POEGMEMA may be
grown from intact Cl initiators that were masked during exposure.
Corrals, traps, and other structures formed in this way enable the
patterning of proteins, vesicles, and, following vesicle rupture,
supported lipid bilayers (SLBs). Bilayers adsorbed on the carboxylic
acid-terminated surfaces formed by C–Cl bond photolysis in
CMPTS exhibit high mobility. SLBs do not form on POEGMEMA. Using traps
consisting of carboxylic acid-functionalized regions enclosed by POEGMEMA
structures, electrophoresis may be observed in lipid bilayers containing
a small amount of a fluorescent dye. Segregation of dye at one end
of the traps was measured by fluorescence microscopy. The increase
in the fluorescence intensity was found to be proportional to the
trap length, while the time taken to reach the maximum value was inversely
proportional to the trap length, indicating uniform, rapid diffusion
in all of the traps. Nanostructured materials were formed using interferometric
lithography. Channels were defined by exposure of CMPTS films to maxima
in the interferogram, and POEGMEMA walls were formed by ATRP. As for
the micrometer-scale patterns, bilayers did not form on the POEGMEMA
structures, and high lipid mobilities were measured in the polymer-free
regions of the channels.