“…In the literature, both bottom-up and top-down methods have been employed to fabricate a patterned array of perovskites. Bottom-up approaches have been explored, such as printing perovskite patterns through inkjet and roller printing, − or using patterned PDMS molds and packed colloidal spheres for growing perovskite crystals in confined spaces. − Various other templates have also been used, such as anodized aluminum oxide membranes and patterned TiO 2 films for the confined crystallization of perovskite arrays. − Top-down approaches, such as photolithography, e-beam lithography, and atomic force microscopy, have been employed. , Conventional photolithography involves photoresist that is patterned and developed on top of the perovskite layer followed by etching of exposed perovskite thin films. , This method has been modified by prepatterning the substrates followed by spin-coating of perovskite precursors to avoid the step to lift-off the photoresist. − Although these top-down methods provide good quality patterned thin films, several steps involved in the patterning and curing of the photoresist, lift-off, and etching drive up the cost and processing time of fabrication and affect the perovskite properties that jeopardize scaling-up. High-quality, low-cost, and yet simple surface micropatterning techniques are still highly desired.…”