Makyoh topography: a simple yet powerful optical method for flatness and defect characterization of mirror-like surfaces

Riesz, Ferenc

doi:10.1117/12.546018

Cited by 20 publications

(11 citation statements)

References 36 publications

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“…Deformation over the whole wafer was quantitatively studied by Makyoh topography [5]: in Makyoh topography, the sample is illuminated with a collimated light beam structured by a square grid and the reflected beam is detected by a CCD camera. The displacement of the grid node position is proportional to the slope, from which the height map is obtained by integration.…”

Section: Methodsmentioning

confidence: 99%

Wafer curvature analysis in 3C-SiC layers grown on (001) and (111) Si substrates

Bosi¹,

Attolini²,

Watts³

et al. 2011

Journal of Crystal Growth

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Section: Methodsmentioning

confidence: 99%

Wafer curvature analysis in 3C-SiC layers grown on (001) and (111) Si substrates

Bosi¹,

Attolini²,

Watts³

et al. 2011

Journal of Crystal Growth

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“…Another limit is that it can not be used to give quantitative detecting results, just qualitative or semi-quantitative [9] . This problem holds back the development for the MT in the high-level exact characterization.…”

Section: Limitsmentioning

confidence: 98%

“…One dimensional geometrical optical approach is fast, simple and easy to implement for 1D. However, the method cannot be generalised to 2D, because it limited by arithmetic [9] . MT with structured illumination is advancement for quantitative detecting.…”

Section: Limitsmentioning

confidence: 99%

Research of light reflex surface defects detection technology

et al. 2007

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The surface defects (indentations, humps, scores) of semiconductor wafers are the major factor to affect the performance of the semiconductor devices. Moreover, these defects make the manufacturing process difficult or yield of the semiconductor devices decrease. Consequently, it is necessary to do an on-line wafers detection in the benefit of the performance and yield of the devices. Thus, developing a way suited for practical detection is the urgent affair faced to people. The optical methods are the most suited ways for surface defects detection because of their non-contact operation. We discuss a relatively unknown method of the light reflex surface defects detection technology (Makyoh (or magic-mirror) topography (MT)). The optical system that we designed achieves the detection mode of the parallel light vertical incidence for the first time. It corrects the deviation between the tradition light path and arithmetic, promotes the detection precision. A lot of experiments based on this optical system are taken to get the difference between the detection modes of vertical incidence and the oblique incidence. The experiments prove that the vertical incidence mode excels the oblique incidence mode. The MT images are also analyzed and disposed. The quantitative measurement can be realized by digital image processing technology.

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“…This technique has been applied mainly for the qualitative inspection of the surface quality of semiconductor wafers (see Ref. [4] for a review). MT has been successful due to its simplicity, low cost and real-time operation.…”

Section: Introductionmentioning

confidence: 99%

“…Makyoh (or magic-mirror) topography (MT) is a powerful topographic tool for qualitative visualization of the surface morphology of semiconductor wafers and other mirror-like surfaces [1][2][3][4]. MT gets its name from an ancient mirror of Japanese origin.…”

Section: Introductionmentioning

confidence: 99%