Maillard reaction-derived laser lithography for printing functional inorganics

Dai, Xianwei; Jiang, Yining; Wang, Xiaohan; Chen, Fengnan; Gao, Liang; Li, Xiaofeng; Zou, Guifu

doi:10.1007/s11426-022-1230-x

Cited by 1 publication

(2 citation statements)

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“…Previous work has revealed a laser-induced copolymerization process of an aqueous precursor consisting of sugar and PEI. 33 Herein, the e-beam-induced cross-linking mechanism is analyzed by near-edge X-ray absorption fine structure (NEXAFS, Figure 2a) and X-ray photoemission spectroscopies (XPS, Figure 2b). Figure 2a shows the normalized carbon Kedge NEXAFS spectra of pure maltose and the maltose-PEI copolymer.…”

Section: Resultsmentioning

confidence: 99%

“…On the other hand, various RIE-free routes have been devised with e-beam-sensitive organic solvent resists that contain metal–organic, metal ions or inorganic nanomaterials, which can readily fabricate sub-10 nm metallic or metal oxide nanopatterns. − For instance, a spin-coatable resist − has been applied to fabricate metal oxide nanopatterns by using organometallic compound as metal source, in which toxic developers (e.g., toluene and trichloromethane) are required. Notably, optical or laser lithography routes for the additive printing of various functional inorganic materials have been reported, but the achieved resolutions limit in the range from a few hundred nanometers to several micrometers. − Therefore, it is indispensable to find a kind of eco-friendly aqueous resists for high-precision inorganic nanopatterns with RIE-free EBL-assisted fabrication.…”

Section: Introductionmentioning

confidence: 99%

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All-Water Etching-Free Electron Beam Lithography for On-Chip Nanomaterials

et al. 2023

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Electron beam lithography uses an accelerated electron beam to fabricate patterning on an electron-beam-sensitive resist but requires complex dry etching or lift-off processes to transfer the pattern to the substrate or film on the substrate. In this study, etching-free electron beam lithography is developed to directly write a pattern of various materials in all-water processes, achieving the desired semiconductor nanopatterns on a silicon wafer. Introduced sugars are copolymerized with metal ions-coordinated polyethylenimine under the action of electron beams. The all-water process and thermal treatment result in nanomaterials with satisfactory electronic properties, indicating that diverse on-chip semiconductors (e.g., metal oxides, sulfides, and nitrides) can be directly printed on-chip by an aqueous solution system. As a demonstration, zinc oxide patterns can be achieved with a line width of 18 nm and a mobility of 3.94 cm2 V–1 s–1. This etching-free electron beam lithography strategy provides an efficient alternative for micro/nanofabrication and chip manufacturing.

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Section: Resultsmentioning

confidence: 99%