Magnetron sputtering of hard Cr–Al–N–O thin films

Influence of oxygen content on structure and properties of multi-element AlCrSiON oxynitride thin films

“…These suggest that the incorporation of oxygen atoms into the films becomes more effective with enhancing deposition temperature or increasing the reactive gas ratio in the sputtering process. Comparable results were observed in other oxynitride works [2,3,10], but the rate of substitution as indicated in these studies is in general lower than those observed in this work. This can be explained by higher content of Al and Si in present work, which have higher affinity with oxygen than with nitrogen, and possess stronger reactivity with oxygen than the samples used in these studies.…”

“…Among this particular family of ceramics, transition metal oxynitrides have attracted both technical and scientific interests, because of their remarkable mechanical, thermal, electrical and optical properties [2][3][4][5]. The oxygen content, film homogeneity, and crystallographic structure were reported to have a great influence on the final properties of the films.…”

“…Stüber et al [3] studied the growth and microstructure formation of Cr-Al-N-O coatings deposited by reactive magnetron sputtering and non-reactive sputtering from segmented targets following a combinatorial material science approach. All coatings independent of their elemental composition showed nanocrystalline building blocks with high hardness and greater toughness.…”

Structure of multilayered Cr(Al)N/SiOx nanocomposite coatings fabricated by differential pumping co-sputtering

“…Structure of multilayered Cr(Al)N/SiO x nanocomposite coatings fabricated by differential pumping co-sputtering Masahiro Kawasaki, 1,a) Masateru Nose, 2 Ichiro Onishi, 3 A Cr(Al)N/38 vol. % SiO x hard coating was prepared on a (001) Si substrate at 250 C in a differential pumping co-sputtering system, which has two chambers for radio frequency (RF) sputtering and a substrate holder rotating on the chambers.…”

Effects of antireflection layers on the optical and thermal stability properties of a spectrally selective CrAlN–CrAlON based tandem absorber

“…The CrMoN(H)/CrMoN(L)/CrON tandem absorber exhibited high absorptance in the range of 0.90-0.92 and emittance in the range of 0.13-0.15 [19]. In addition, the oxynitride such as Cr-Al-O-N coatings combined metallic and covalent bonded phases in a novel nanocomposite thin film structure and possessed excellent mechanical properties [20][21][22]. Nanoindentation measurements showed that Al-rich oxide or nitride films have hardness values of 24-28 GPa, whereas the oxynitride films have a hardness of $ 30 GPa, regardless of the Cr and Al contents [22].…”