Magnetoresistance Effect of Co–Cu Nanostructure Prepared by Electrodeposition Method

Effect of pulse plating and additive on phase separation in Cu–Co nano-granular alloys

“…However, previous investigators primarily concentrated on DC electrolysis of Cu-Co alloys [11,[13][14][15][20][21][22][23][24][25], and the effect of various parameters like deposition current density or potential [11,15,25], additive agents [21], electrolyte pH [15], cobalt concentration [14], annealing conditions [23,25], substrate [26], etc. on cobalt content of the deposit and GMR were explored.…”

Magnetic properties and magnetoresistance effect in Co/Au, Ag nano‐structure films produced by pulse electrodeposition

“…Furthermore, it becomes a very useful method for the development of the research in nano-ordered multilayered films with the combination of ferromagnetic and non-magnetic layers, which shows the giant magnetoresistance effect [1][2][3]. It is possible to control the film composition, thickness of multilayer and grain size in an atomic order by regulating the pulse amplitude and width [4][5][6][7]. If the pulse width of deposition time to produce multilayers is reduced to very small values, the multilayer film with layers of two different atomic compositions eventually results in a binary alloy of solid solution type mixed in the atomic level.…”

Ferromagnetic Multilayers: Magnetoresistance, Magnetic Anisotropy, and Beyond

“…Chemical processes range from simple chemical deposition method to more advance constant current galvanostatic, potentiostatic, and potentiodynamic to Pulsed-current electrodeposition techniques to chemical vapor deposition methods such as Plasma, Laser and Thermal vapor deposition [5,32,34,60,63,[97][98][99][100][101][102][103][104][105][106][107][108][109][110][111].…”