1989
DOI: 10.2493/jjspe.55.1379
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Magneto-optical disk formed by contact printing.

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“…See Ref. (7). However , reactive ion etching is a relatively slow processwe observed etching rates of <0.1 nrn/sec.…”
Section: Residual T Resist Ashed T_ _ _ _ _ _ _ _ _mentioning
confidence: 82%
“…See Ref. (7). However , reactive ion etching is a relatively slow processwe observed etching rates of <0.1 nrn/sec.…”
Section: Residual T Resist Ashed T_ _ _ _ _ _ _ _ _mentioning
confidence: 82%