Magnetic susceptibility and defect structure of B1 phase MoN sputtered films

Linker, G.; Schmidt, Helmut; Politis, Constantinus; Smithey, R.; Ziemann, P.

doi:10.1088/0305-4608/16/12/024

Cited by 26 publications

(15 citation statements)

References 12 publications

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“…5,20 The theoretically predicted low-energy structure for n-MoN is a vacancy-rich NbO-prototype (Pm-3m), 21 which can be seen as an NaCl-type structure with 25% vacancies at each sublattice. 22 Intriguingly, the n-MoN phase is predicted to have the highest superconducting temperature among all refractory binary carbides and nitrides T c ¼ 29.4 K. 23 Guided by computational predictions, we study the impact of nitrogen vacancies on structure, phase evolution, and resulting mechanical properties of Mo-N coatings. These were developed by adjusting the nitrogen partial pressure during reactive magnetron sputtering using a Mo-target.…”

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confidence: 99%

The impact of nitrogen content and vacancies on structure and mechanical properties of Mo–N thin films

Klimashin

Koutná

Euchner

et al. 2016

Journal of Applied Physics

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Based on a combined computational and experimental study, we show that besides the thermodynamically stable β-MoN0.5 and δ2-MoN phases, also metastable γ-MoNx and its ordered relative γ′-MoNx can be synthesized by physical vapor deposition. The formation of the NaCl-based γ-MoNx phase is favored for nitrogen concentrations between 23 and 34 at.% (i.e., x = 0.30–0.53). Higher nitrogen contents (close to the 3:2 stoichiometry, hence, MoN0.67) favor the ordering of the vacancies at the nitrogen sublattice (hence, γ′-MoNx). The highest hardness of ∼33 GPa is obtained for single-phase cubic-structured γ-MoN0.53 coatings, whereas the ordered γ′-MoN0.67 coatings are slightly softer with a hardness of ∼28 GPa.

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confidence: 99%

The impact of nitrogen content and vacancies on structure and mechanical properties of Mo–N thin films

Klimashin

Koutná

Euchner

et al. 2016

Journal of Applied Physics

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“…However, the number of peaks was changed, which indicates a change in the crystalline phase of γ-Mo 2 N, something that could be assigned to the formation of hexagonal MoN and the B1-MoN phases [16,26]. The B1-MoN phase is also known as cubic metastable ζ-MoN phase [9,27,28]. The XRD pattern exhibits weak peaks at 2θ = 47.8°, 54.7°and 56.4°, which correspond to undesirable polychromatic substrate reflections.…”

Section: Structural Propertiesmentioning

confidence: 99%

Correlation between mechanical and microstructural properties of molybdenum nitride thin films deposited on silicon by reactive R.F. magnetron discharge

Bouaouina

Besnard

Abaidia

et al. 2018

Surface and Coatings Technology

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is an open access repository that collects the work of Arts et Métiers ParisTech researchers and makes it freely available over the web where possible. A B S T R A C TMolybdenum nitride thin films were deposited on (100) silicon substrates by R.F. magnetron sputtering of a Mo target in a (Ar-N 2 ) gas mixtures. The films were studied by Scanning Electron Microscopy (SEM), Energy Dispersive Spectroscopy (EDS) and X-ray diffraction. The nanomechanical properties have been determined by nanoindentation and Peak-Force Quantitative Nanomechanical Mapping (PF-QNM). The total internal stresses were determined by curvature measurements and the Stoney formula. As thin film composition influences the morphology, the stress state and the mechanical properties, modifications are expected in this study where the nitrogen content is tuned. The film exhibits a polycrystalline structure with preferred orientation along (111) plane. The increase of the nitrogen content in the coating (N/ Mo = 1.1) induces a broadening of the full width at half maximum (FWHM) of the (111) diffraction peak, which is attributed to the presence of smaller crystallites. The residual stress and mechanical properties variation were correlated to the structural transition from γ-Mo 2 N to hexagonal and cubic MoN. The results show a good agreement between the nanomechanical properties obtained by nanoindentation and PF-QNM.

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“…13 When comparing the relative intensities of the Mo peaks, the higher temperatures enhanced the amount of crystalline Mo. Linker et al 22 reported that the amount of crystalline Mo increased and the amount of Mo nitrides decreased with increasing target temperature in the range of 673 to 1073 K. They suggested that more nitrogen could dissolve in the Mo lattice at elevated temperatures; hence the amount of unreacted Mo increased with increasing target temperature. Our results are qualitatively consistent with their conclusions.…”

Section: Effect Of Target Temperaturementioning

confidence: 99%

Preparation of molybdenum nitride thin films by N⁺ ion implantation

Choi

Thompson

1992

J. Mater. Res.

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A series of molybdenum nitride films were synthesized by implanting energetic nitrogen ions into molybdenum thin films. The resulting films were characterized using x-ray diffraction to determine the effects of nitrogen ion dose (4 x 10 16 -4 x 10 17 N + /cm 2 ), accelerating voltage (50-200 kV), and target temperature (~298-773 K) on their structural properties. The order of structural transformation with increased incorporation of nitrogen ions into the Mo film can be summarized as follows: Mo -• 7-Mo 2 N -> <5-MoN. Nitrogen incorporation was increased by either increasing the dose or decreasing the ion energy. At elevated target temperatures the metastable B l -M o N phase was also produced. In most cases the Mo nitride crystallites formed with the planes of highest atomic density parallel to the substrate surface. At high ion energies preferential orientation developed so that the more open crystallographic directions aligned with the ion beam direction. We tentatively attributed this behavior to ion channeling effects.

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Magnetic susceptibility and defect structure of B1 phase MoN sputtered films

Cited by 26 publications

References 12 publications

The impact of nitrogen content and vacancies on structure and mechanical properties of Mo–N thin films

The impact of nitrogen content and vacancies on structure and mechanical properties of Mo–N thin films

Correlation between mechanical and microstructural properties of molybdenum nitride thin films deposited on silicon by reactive R.F. magnetron discharge

Preparation of molybdenum nitride thin films by N⁺ ion implantation

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Magnetic susceptibility and defect structure of B1 phase MoN sputtered films

Cited by 26 publications

References 12 publications

The impact of nitrogen content and vacancies on structure and mechanical properties of Mo–N thin films

The impact of nitrogen content and vacancies on structure and mechanical properties of Mo–N thin films

Correlation between mechanical and microstructural properties of molybdenum nitride thin films deposited on silicon by reactive R.F. magnetron discharge

Preparation of molybdenum nitride thin films by N+ ion implantation

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Preparation of molybdenum nitride thin films by N⁺ ion implantation