Abstract:Ni(60Å)/Cu film possessing perpendicular magnetic anisotropy (PMA) changes its easy
direction into the plane by ion irradiation, due to the relaxation of the strain. By fixing our eyes upon
this magnetic property, the magnetic patterning of Ni(60Å)/Cu film using 40 keV O ion irradiation
was performed through the photo-resist (PR) mask having 10㎛ x 10 ㎛pattern sizes to pattern the
magnetic film. After the PR mask removal of an irradiated film, the magnetic properties were
investigated by the magneto-optic Kerr … Show more
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