1985
DOI: 10.1103/physrevb.31.2535
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Magnetic-field-enhanced electron-electron scattering in the resistivity of copper

Abstract: Our measurements of the electrical resistivity p&(T) on high-quality copper whiskers reveal a T variation at very low temperatures. %ith the taking into account of appreciable corrections for surface scattering, the coefficient for electron-electron scattering in bulk copper could be determined, A =d, p/T2=27 fQ cmK, in good agreement with calculations assuming an isotropic relaxation time v(k). For the first time, a strong enhancement of A by a longitudinal magnetic field is observed, which is related to an a… Show more

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Cited by 17 publications
(19 citation statements)
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“…S3). This trend is somewhat expected, because the magnetic field suppresses the ZXT kinetic energy of the electrons hence enhances the electron-electron interaction effects [17].…”
Section: Resultsmentioning
confidence: 85%
“…S3). This trend is somewhat expected, because the magnetic field suppresses the ZXT kinetic energy of the electrons hence enhances the electron-electron interaction effects [17].…”
Section: Resultsmentioning
confidence: 85%
“…KW assume dislocation scattering to be the source of anisotropy in z ( K ) and derive an expression for the enhancement of A,, by dislocations Here pimp and pdis denote the contributions of (isotropic) impurity and (anisotropic) dislocation scattering to the residual resistivity pr = p(T+ 0) of a metal sample. When the isotropic limitA Et and the 'sample dependence' SD (defined in equation (3.10)) are used as fitting parameters, then fairly good agreement is found with the experimental data for K and Cu (Steenwyck et a1 1981, Zwart et a1 1983, Thummes and Kotzler 1985.…”
Section: Introductionmentioning
confidence: 69%
“…Recently, Thummes and Kotzler (1985) have also observed a strong enhancement of A,, by a high longitudinal magnetic field in single crystals of Cu. The enhancement is related qualitatively to a magnetic-field-induced anisotropy in z ( K ) .…”
Section: Introductionmentioning
confidence: 92%
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