“…[3][4][5] One way to overcome the problem is to provide artificial pinning sites in the continuous magnetic films as originally proposed by Gadetsky et al, 6) in which a photolithography was used. In carrying the idea but for the sake of higher data storage density, we have shown denser and smaller pinning domains by using electron beam lithography, 7,8) in which the artificial pinning sites were made in the hole array of polymethyl methacrylate (PMMA). PMMA, however, has certain deficiencies such as it peels off from the substrate easily, which is resulted from cracking during the sputtering of MO film.…”