Magnetic control of breakdown: Toward energy-efficient hollow-cathode magnetron discharges

Baranov, Oleg; Romanov, M.; Kumar, Shailesh; Zhong, Xia; Ostrikov, Kostya Ken

doi:10.1063/1.3553853

Cited by 16 publications

(10 citation statements)

References 38 publications

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“…Iasi Plasma Advanced Research Center (IPARC), Faculty of Physics, Alexandru Ioan Cuza University of Iasi, 700506 Iasi, Romania. email: claudiu.costin@uaic.ro and maintaining the discharge 1,16 . Secondary electrons are used in scanning electron microscopy to form images 17 or in photomultiplier devices to amplify signals 18 .…”

Section: Openmentioning

confidence: 99%

“…On the other hand, the SEE process has its benefits. For all electrical discharges governed by Townsend’s breakdown theory, the process of SEE induced by ion bombardment at the cathode is essential for both ignition and maintaining the discharge 1 , 16 . Secondary electrons are used in scanning electron microscopy to form images 17 or in photomultiplier devices to amplify signals 18 .…”

Section: Introductionmentioning

confidence: 99%

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Secondary electron emission under magnetic constraint: from Monte Carlo simulations to analytical solution

Costin

2021

Sci Rep

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The secondary electron emission process is essential for the optimal operation of a wide range of applications, including fusion reactors, high-energy accelerators, or spacecraft. The process can be influenced and controlled by the use of a magnetic field. An analytical solution is proposed to describe the secondary electron emission process in an oblique magnetic field. It was derived from Monte Carlo simulations. The analytical formula captures the influence of the magnetic field magnitude and tilt, electron emission energy, electron reflection on the surface, and electric field intensity on the secondary emission process. The last two parameters increase the effective emission while the others act the opposite. The electric field effect is equivalent to a reduction of the magnetic field tilt. A very good agreement is shown between the analytical and numerical results for a wide range of parameters. The analytical solution is a convenient tool for the theoretical study and design of magnetically assisted applications, providing realistic input for subsequent simulations.

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Section: Openmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Secondary electron emission under magnetic constraint: from Monte Carlo simulations to analytical solution

Costin

2021

Sci Rep

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“…This effect was observed for low values of magnetic field. This mean that magnetic field increase the resistance of discharge for low values of magnetic fields (0 to 10) mT, due to non -ionizing collision of electrons with other plasma particles (Baranov, 2011). For larger values of magnetic fields (15 to 25)mT, Values of the discharge voltage when applying the field for argon are less than those in case the field is turned off for higher values of field.…”

Section: Axial Variation Of Magnetic Fieldmentioning

confidence: 97%

Measurement of Some Argon Plasma Parameters Glow Discharge Under Axial Magnetic Field

Karim

Mayi

Al-Hakary

2019

SJUOZ

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This paper investigates the characteristics some of argon plasma parameters of glow discharge under axial magnetic field. The DC power supply of range (0-6000) V is used as a breakdown voltage to obtain the discharge of argon gas. The discharge voltagecurrent (V-I) characteristic curves and Paschen's curves as well as the electrical conductivity were studied with the presents of magnetic field confinement at different gas pressures. The magnetic field up to 25 mT was obtained using four coils of radius 6 cm and 320 turn by passing A.C current up to 5 Amperes. Spectroscopic measurements are employed for purpose of estimating two main plasma parameters electron temperature (Te) and electron density (ne). Emission spectra from positive column (PC) zone of the discharge have been studies at different values of magnetic field and pressures at constant discharge currents of 1.5 mA. Electron temperature (Te) and its density are calculated from the ratio of the intensity of two emission lines of the same lower energy levels. Experimental results show the abnormal glow region characteristics (positive resistance). Breakdown voltage versus pressure curves near the curves of paschen and decrease as magnetic field increases due to magnetic field confinement of plasma charged particles. Also the electrical conductivity increases due to enhancing magnetic field at different gas pressures. Both temperature density of electron and the intensities of two selected emission lines decrease with increasing pressure due decreasing of mean free path of electron. Electron density increase according to enhancing magnetic field, while the intensity of emitting lines tends to decrease.

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“…Magnetron sputtering systems and vacuum arc guns are considered as the main technological plasma sources used to generate flows of plasmas of conducting materials [1,2]. Magnetron discharge is widely applied in science and technology for decades, while investigation of its operational principles is still a problem [3,4], and large number of theoretical and experimental researches is dedicated to it [5,6].…”

Section: Introductionmentioning

confidence: 99%

Discharge Characteristics of the Magnetron System for Sputtering, Deposition, and Nanotechnology Applications

Breus

Serdiuk

Ruzaikin

et al. 2020

aktt

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Magnetron sputtering is known for years as a powerful tool for coating deposition of cutting tools and machine parts. However the experimental measurements of the magnetron discharge parameters are still necessary to provide a consumer of the magnetron system with the reliable characteristics. A voltage-current relation is the most applied characteristic of the discharge, and it is described as the power low of a type U = U0 + aIn, where U and I are the voltage drop and the discharge current, respectively, and U0 and n are constant. First part of the research is dedicated to the experiments conducted in the magnetron setup provided with the titanium cathode in a vacuum chamber filled with argon or argon-nitrogen mixture, and the constants are determined for the particular geometry of the magnetron sputtering system. The obtained results can be used to choose the operation modes for the traditional applications of the magnetron discharge such as ion cleaning and heating of the non-magnetic workpieces arranged on the cathode, as well as for the sputtering deposition of the titanium and titanium nitride coatings on the surfaces of the workpieces located above the magnetron cathode. In the next part of the research the novel application of the magnetron for production of carbon nanostructures is considered. For the purpose, a layer of expanded graphite is arranged on the magnetron cathode, and the discharge is initiated in oxygen atmosphere. It was found that for the time interval of a few hours the discharge is described as a superposition of the typical magnetron glow with arc spot generation, and the intensity of the arcs is not decreased with time. At that, the arc initiation was accompanied with the formation of clusters of the graphite cathode. The process is explained in terms of the cathode spot generation at the interaction of the arc plasma with the non-melting material. This process can be beneficial for the development of the plasma reactors for the large-scale production of the carbon species at the low gas pressures suitable for the magnetron discharge operation. Thus, the magnetron sputtering systems provided with the expanded graphite cathode can be considered as the tool to grow carbon nanospecies in the arc discharge cathode spots.

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Magnetic control of breakdown: Toward energy-efficient hollow-cathode magnetron discharges

Cited by 16 publications

References 38 publications

Secondary electron emission under magnetic constraint: from Monte Carlo simulations to analytical solution

Secondary electron emission under magnetic constraint: from Monte Carlo simulations to analytical solution

Measurement of Some Argon Plasma Parameters Glow Discharge Under Axial Magnetic Field

Discharge Characteristics of the Magnetron System for Sputtering, Deposition, and Nanotechnology Applications

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