Magnesium silicide thin film formation by reactive diffusion

Kogut, Igor; Record, Marie‐Christine

doi:10.1016/j.tsf.2012.08.037

Cited by 27 publications

(20 citation statements)

References 19 publications

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“…This is in agreement with the formation of highly disordered magnesium silicide features that was reported by Kubo et al, after 400°C annealing of an ultra-thin Mg film deposited on Si(100) slightly beyond saturation [11]. Also, the formation of polycrystalline thin Mg2Si has previously been reported on both Si(100) and Si(111) by thermal codeposition [21] and reactive diffusion [8] at 200°C. Considering these results, our investigation may also indicate a small polycrystalline structure for the formed silicide thin films, i.e.…”

Section: Resultssupporting

confidence: 91%

“…More recently, Mg2Si ultra-thin films formed on silicon have shown great potential regarding both thermoelectric considerations and Si-based devices compatibility. By reducing the thermal conductivity provided by phonons, such lowdimensionality films would produce a pathway towards thermoelectric generators with high conversion efficiency [8]. The confined growth of nanometric thin films of Mg2Si on silicon, however, has been stated as a challenging task.…”

Section: Introductionmentioning

confidence: 99%

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Growth, stability and decomposition of Mg2Si ultra-thin films on Si (100)

Sarpi

Zirmi

Putero

et al. 2018

Applied Surface Science

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International audienceUsing Auger Electron Spectroscopy (AES), Scanning Tunneling Microscopy/Spectroscopy (STM/STS) and Low Energy Electron Diffraction (LEED), we report an in-situ study of amorphous magnesium silicide (Mg2Si) ultra-thin films grown by thermally enhanced solid-phase reaction of few Mg monolayers deposited at room temperature (RT) on a Si(100) surface. Silicidation of magnesium films can be achieved in the nanometric thickness range with high chemical purity and a high thermal stability after annealing at 150 °C, before reaching a regime of magnesium desorption for temperatures higher than 350 °C. The thermally enhanced reaction of one Mg monolayer (ML) results in the appearance of Mg2Si nanometric crystallites leaving the silicon surface partially uncovered. For thicker Mg deposition nevertheless, continuous 2D silicide films are formed with a volcano shape surface topography characteristic up to 4 Mg MLs. Due to high reactivity between magnesium and oxygen species, the thermal oxidation process in which a thin Mg2Si film is fully decomposed (0.75 eV band gap) into a magnesium oxide layer (6–8 eV band gap) is also reported

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Section: Resultssupporting

confidence: 91%

Section: Introductionmentioning

confidence: 99%

Growth, stability and decomposition of Mg2Si ultra-thin films on Si (100)

Sarpi

Zirmi

Putero

et al. 2018

Applied Surface Science

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“…[13][14][15][16][17][18] Typical synthesis procedures for forming nanostructured Mg 2 Si are spark plasma sintering of nanopowders, 19,20 solid-state phase transformation for nanowires, 21 heat treatment of Si nanorods 22 or reactive diffusion in a vacuum for thin films. 23 In the present work, we address the challenges of a deliberate tailoring of the porous morphology of phase pure magnesium silicide free-standing monoliths. To the best of our knowledge, this is the first report on the preparation of magnesium silicide monoliths with a cellular macroporous network comprising interconnected crystallites with sizes in the upper nanometer regime.…”

Section: Introductionmentioning

confidence: 99%

Monolithic porous magnesium silicide

et al. 2017

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a Macroporous magnesium silicide monoliths were successfully prepared by a two-step synthesis procedure. The reaction of gaseous magnesium vapor with macro-/mesoporous silicon, which was generated from hierarchically organized meso-/macroporous silica by a magnesiothermic reduction reaction, resulted in monolithic magnesium silicide with a cellular, open macroporous structure. By adjusting the reaction conditions, such as experimental set-up, temperature and time, challenges namely loss of porosity or phase purity of Mg 2 Si were addressed and monolithic magnesium silicide with a cellular network builtup was obtained.

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“…Although an abundant literature exists on the fabrication of Mg 2 Si thin films [6][7][8][9][10][11][12][13][14], their thermoelectric properties have not been experimentally investigated. Only a few theoretical studies have been reported on the calculations of Mg 2 Si thin films, either dealing with the structural and electronic characteristics [15], or the thermoelectric properties of the films [16].…”

Section: Introductionmentioning

confidence: 99%