2008
DOI: 10.1016/j.jcrysgro.2008.04.008
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Magnesium diffusion profile in GaN grown by MOVPE

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Cited by 38 publications
(23 citation statements)
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“…The energy barriers generally increase with ionic radius and ionic charge, but their interplay leads to nontrivial effects. The energy barriers of Mg 2+ calculated in this work support experimental estimates of about 2 eV .…”
Section: Discussionsupporting
confidence: 84%
See 1 more Smart Citation
“…The energy barriers generally increase with ionic radius and ionic charge, but their interplay leads to nontrivial effects. The energy barriers of Mg 2+ calculated in this work support experimental estimates of about 2 eV .…”
Section: Discussionsupporting
confidence: 84%
“…The description of the Mg diffusion process in GaN achieved so far is highly inconsistent. Experimental investigations lead to a large spread of diffusion barriers ranging from 1.3 to 5 eV . Recent experimental estimates situate the transition barrier in a fairly large interval ranging from 1.3 to 2.0 eV .…”
Section: Introductionmentioning
confidence: 99%
“…This could be particularly critical at the growth temperature of 1300 K. An experimental study has determined the diffusion coefficient of Mg in GaN to follow an Arrhenius behavior, characterized by an acrtivation energy of 1.9 eV and a prefactor of D 0 = 2.8 × 10 −7 cm 2 /s. 51 On this basis, we estimate a linear diffusion length of 0.13 µm for a period of two hours, corresponding to typical growth conditions. This distance is short compared to typical layer thicknesses of 1 to 2 µm.…”
Section: A Formation Free Energymentioning
confidence: 99%
“…This can explain the differences of the DAP band for the different samples studied. The differences in the DAP band shape observed between ours porous GaN layers and the p-type substrate seems to suggest the incorporation of Mg acceptors in the lower part of the porous layer that would diffuse from the substrate as a consequence of the deposition temperature used as pointed out before [32,33].…”
Section: Experimental and Samplesmentioning
confidence: 81%