Oak Ridge, Tennessee 37831 *colliercp@ornl.gov, fax 1 (865) 574-1753
Supporting Information
Table of ContentsMold fabrication …………………………………………………………………………. S2
Device fabrication………………………………………………………………………… S3Inlet and mixing stability tests …………………………………………………………… S4
Plug formation stability…………………………………………………………………… S6Droplet size distributions and optical calibration procedures……………………………. S8
Determination of Droplet Diameter………………………………………………… S8Determination of Total Fluorescence Signal (I tot ) from the Droplet……………….. S9Conversion between I tot and fluorescent resorufin concentration………………….. S10Trapped droplet stability…………………………………………………………………. S11Bulk kinetics --Lineweaver Burk plot…………………………………………………… S12
S2Control experiments for kinetic data from droplets in Figure 2…………………………. S12Product inhibition of β-Gal by galactose…………………………………………… S13Photoreactions involving singlet oxygen…………………………………………… S14 Photobleaching……………………………………………………………………… S14Loss of ions at interface...…………………………………………………………… S16Correlation plots of enzyme activity, plug length and droplet diameter vs. backing pressure S16Estimation of capillary number based on the geometry of deformed droplet…………… S19Testing role of interface with inclusion of aqueous PEG600 as crowding agent in droplets S20Comparison of droplet kinetics with traditional assays for detecting nonspecific adsorption S21Interfacial tension measurements from pendant drops……………………………… S23Laser scanning confocal microscopy images of microemulsions…………………… S25S/V scaling of enzyme densities in droplets………………………………………… S27Epifluorescent images of daughter droplets containing labeled enzymes…………… S29Calculation of p-value using student t-test in Figure 2B of main text……………………. S30Raw data for Figure 2B of main text……………………………………………………… S30References………………………………………………………………………………… S30
Mold fabricationTriple-layer photolithography was used to fabricate a silicon master for fabricating PDMS devices by micromolding. Patterns containing the round control button for the control valve, the side channel, and the main channel were drawn in separate layers in AutoCAD 2004 and imaged at 20,000 dot-per-inch resolution onto optical transparencies (CAD/Art Services, Inc., Bandon, OR). To make the control button, a piece of isopropyl alcohol (IPA)-cleaned silicon wafer was spin-coated with positive-tone SPR 220-7 photoresist (Shipley Company, L.L.C., Marlborough, MA) at 4000 rpm. After soft-baking at 115°C for 90 seconds, the resist was exposed to UV light under a photomask for 100 seconds at 14.9 mW/cm 2 on a Karl-Suss MA 6 mask aligner (Suss MicroTec AG, Garching, Germany). MIF-319 S3 developer (Rohm & Haas Electronic Materials, Philadelphia, PA) was used to develop the pattern, followed by rinsing with 18 MΩ water. Overnight baking in an oven at 190° C rounded the feature and stabilized the photoresist. A second layer of AZ 50 positive photoresist (AZ Electronic Materials USA Corp., Branchburg, NJ) was spin-coated at 4000 rpm onto the wafer to make the side channel. The soft bake con...