Machine Learning Pattern Recognition Algorithm With Applications to Coherent Laser Combination

Wang, Dan; Du, Qiang; Zhou, Tong; Gilardi, Antonio; Kiran, Mariam; Mohammed, Bashir; Li, Derun; Wilcox, Russell

doi:10.1109/jqe.2022.3204437

IEEE J. Quantum Electron.

2022

DOI: 10.1109/jqe.2022.3204437

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Machine Learning Pattern Recognition Algorithm With Applications to Coherent Laser Combination

Dan Wang

Qiang Du

Tong Zhou

et al.

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Cited by 2 publications

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Numerical Analysis of a High-Pressure Spatial Chemical Vapor Deposition (HPS-CVD) Reactor for Flow Stability at High Pressures

Enayati,

Pimputkar

2024

Crystals

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Highly indium-rich group-III nitrides are attracting attention for advancing our capacity to create highly effective optical emitters at extended visible/IR wavelengths or for enhancing bandgap engineering possibilities within the group-III nitride material framework. Current methods of synthesis are constrained in their efficacy, partially owing to the low decomposition temperature of indium nitride. Implementation of a new design of a vertical high-pressure spatial chemical vapor deposition (HPS-CVD) reactor with six separated precursor source zones and a rotating wafer carrier disk carrying four 2-inch wafers is proposed and analyzed using COMSOL Multiphysics as a commercial computational fluid dynamics (CFD) program to study the fluid phenomena inside the numerical domain. This study focuses on understanding the different flow patterns within the chambers at super-atmospheric conditions (5 atm to 30 atm) and identifying suitable operating conditions under which smooth and dominant vortex-free flow is achieved. Four 2-inch wafers are heated to maintain a temperature of 1200–1300 K at each pressure and gas type. Three different gas types (nitrogen, hydrogen, and ammonia) are used, and the impacts of different inlet flow velocities and rotational speeds are investigated and discussed. An operating matrix is presented for each analyzed system pressure providing suitable combinations of these operational variables for smooth flow in the chambers. Each gas type was identified to have a range of suitable rotational and inlet velocity regimes at each operating pressure. Overlap of these three gas-specific operating condition windows resulted in the identification of a generally suitable operating condition for smooth flow patterns in the system regardless of the gas type used, as required for the growth of group-III nitride materials.

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Numerical Analysis of a High-Pressure Spatial Chemical Vapor Deposition (HPS-CVD) Reactor for Flow Stability at High Pressures

Enayati,

Pimputkar

2024

Crystals

View full text Add to dashboard Cite

show abstract

机器学习在光纤激光阵列相位调控中的研究进展与发展趋势

Gao Zhiqaing,

Chang Qi,

Liu Haoyu

et al. 2023

中国激光

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Machine Learning Pattern Recognition Algorithm With Applications to Coherent Laser Combination

Cited by 2 publications

References 32 publications

Numerical Analysis of a High-Pressure Spatial Chemical Vapor Deposition (HPS-CVD) Reactor for Flow Stability at High Pressures

Numerical Analysis of a High-Pressure Spatial Chemical Vapor Deposition (HPS-CVD) Reactor for Flow Stability at High Pressures

机器学习在光纤激光阵列相位调控中的研究进展与发展趋势

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