PACS 78.45.+h, 78.47.+p, 78.55.Cr, 78.67.De Room-temperature lateral emission in In 0.15 Ga 0.85 N/GaN multiple quantum wells (MQWs) of various well thicknesses has been studied by means of excitation-density and time-resolved photoluminescence spectroscopy. The lowest threshold of stimulated emission and the highest emission efficiency has been observed in the structures with the well thickness d = 3 nm. The existence of an optimal well thickness is attributed to enhanced nonradiative recombination for thinner wells and to larger-well-width−invoked indium segregation that results in broadening of the local-state distribution.1 Introduction Ternary InGaN-based multiple quantum wells (MQWs) are the key structures for high efficiency, long lifetime violet, blue, and green light emitting diodes and laser diodes [1,2]. Although optical properties of InGaN/GaN quantum well structures are being widely investigated, the emission mechanism is not completely identified so far [1−8]. Well-width and composition fluctuations, complete phase separation, and built-in electric field can lead to formation of localised states of various origin [1][2][3][4][5][6][7][8] with the impact of each effect depending in a complex manner on MQW parameters and growth conditions. To maximise spontaneous and stimulated emission, the underlying physics should be cleared out and the growth conditions and structure of the MQWs are to be optimised.The crucial parameter of a MQW structure is the thickness of the quantum-well layer. Variation in well width results not only in alteration of electronic states by quantum size effect, but also in the quantum-confined Stark effect, as well as in intricate changes of thermodynamics of In segregation that is due to lattice mismatch between InN and GaN. Our previous study on optical and structural properties of InGaN/GaN MQWs has evidenced that an increased well thickness invokes formation of spatially separated In-rich and In-poor regions in the quantum well layers [9][10][11]. Here we report on a study of excitation-density dependent and time-resolved lateral emission in InGaN/GaN MQW structures with various well thickness, d. The high-excitation regime applied enabled us to minimise the built-in electric field effect on emission from localised states.