2018
DOI: 10.1063/1.5038636
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Luminescence behaviour and deposition of Sc2O3 thin films from scandium(III) acetylacetonate at ambient pressure

Abstract: Scandium(III) oxide thin film deposition has been historically difficult to achieve without the use of vacuum-based or wet chemical systems due to precursor limitations of low vapour pressure or ambient instability. In this letter, the adoption of aerosol-assisted delivery of scandium(III) acetylacetonate has enabled the chemical vapour deposition of polycrystalline and amorphous Sc2O3 thin films at ambient pressure with high growth rates (ca. 500 nm h−1). The scandia films were intrinsically highly photolumin… Show more

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Cited by 12 publications
(19 citation statements)
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“…According to XRD data, only cubic Sc 2 O 3 phase (c‐Sc 2 O 3 ) was observed. The preferred orientation was (222), that is a typical value for Sc 2 O 3 films …”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…According to XRD data, only cubic Sc 2 O 3 phase (c‐Sc 2 O 3 ) was observed. The preferred orientation was (222), that is a typical value for Sc 2 O 3 films …”
Section: Resultsmentioning
confidence: 99%
“…Sc 2 O 3 is also commonly used for high‐power laser applications . Moreover, these films exhibit strong photoluminescent character under UV irradiation . In addition, Sc 2 O 3 can be used as the gate oxide material and surface passivation due to its high dielectric permittivity and chemical stability.…”
Section: Introductionmentioning
confidence: 99%
“… 10 , 12 Sc 2 O 3 exhibits strong photoluminescent properties with broad-band luminescence when exposed to UV light. 13 ZnO and Sc 2 O 3 were combined with a SiO 2 matrix to form new PEG/Zn-SiO 2 and PEG/Zn-SiO 2 composites with enhanced full-band light-driven reversible phase transitions.…”
Section: Introductionmentioning
confidence: 99%
“…15,16 It follows that AACVD enables a safer and wider selection of precursors, without many of the inherent hazards associated with thermal CVD precursors such as being corrosive, explosive, highly flammable or posing a risk to human health via inhalation. 14,17,18 AACVD has thus enabled the deposition of a range of films of metallic, 9,10 polymeric 19,20 and metal-oxide [21][22][23] compositions. Until now, AACVD of silver films has largely been led by Molloy et al, [24][25][26] having been achieved by an exhaustive process of precursor preparation, with mixed results with regard to film contamination, conductivity and reflectivity.…”
Section: Introductionmentioning
confidence: 99%
“…Aerosol-assisted chemical vapor deposition (AACVD) is an atmospheric-pressure alternative to thermal APCVD, which avoids the requirement of thermal APCVD that precursors should be appreciably volatile by instead generating an aerosol from a solution of the precursor. , It follows that AACVD enables a safer and wider selection of precursors, without many of the inherent hazards associated with thermal CVD precursors such as being corrosive, explosive, highly flammable, or posing a risk to human health via inhalation. ,, AACVD has thus enabled the deposition of a range of films of metallic, , polymeric, , and metal-oxide compositions. Until now, AACVD of silver films has largely been led by Molloy et al, having been achieved by an exhaustive process of precursor preparation, with mixed results with regard to film contamination, conductivity, and reflectivity.…”
Section: Introductionmentioning
confidence: 99%