“…Aerosol-assisted chemical vapor deposition (AACVD) is an atmospheric-pressure alternative to thermal APCVD, which avoids the requirement of thermal APCVD that precursors should be appreciably volatile by instead generating an aerosol from a solution of the precursor. , It follows that AACVD enables a safer and wider selection of precursors, without many of the inherent hazards associated with thermal CVD precursors such as being corrosive, explosive, highly flammable, or posing a risk to human health via inhalation. ,, AACVD has thus enabled the deposition of a range of films of metallic, , polymeric, , and metal-oxide − compositions. Until now, AACVD of silver films has largely been led by Molloy et al, − having been achieved by an exhaustive process of precursor preparation, with mixed results with regard to film contamination, conductivity, and reflectivity.…”