<title>Space station atomic-oxygen-resistant coatings</title>

Abstract

A Low Earth Orbit (LEO), Atomic Oxygen Resistant (AOR) thin film coating has been developed by Sheldahl, Inc. for use on the Space Station Freedont Photo Voltaic Solar Array Panels. The AOR silicon oxide (SiOx) coating was developed in a irianufacturing system and lends itself to reasonably large production quantities. Test results of the SiOx coating on polyiinide versus uncoated polyiiaide are presented, along with a discussion of the nanufacturing process used. The substrate used for this program was Dupont type H Kapton! The major areas of testing were environnental survivability (atomic oxygen resistance, optical properties, and thermal shock) and physical/mechanical characterization (adhesion, blocking, flexibility, and abrasion resistance).